SCHEMBL236878

SCHEMBL236878

CC(C)[N+](C)(C)C(C)C.O=S(=O)([O-])C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F

nearest known ligand 0.41

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
CA2 P00918 7/20 0.41
CA1 P00915 6/20 0.41
MMP1 P03956 5/20 0.41
MMP2 P08253 5/20 0.41
MMP9 P14780 5/20 0.41
MMP8 P22894 5/20 0.41
MMP13 P45452 5/20 0.41
F2 P00734 4/20 0.34
PRSS1 P07477 4/20 0.34
PRSS2 P07478 4/20 0.34
PRSS3 P35030 4/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL236522 0.98 CA2 (0.39) CA2CA1MMP1MMP2MMP9
SCHEMBL5522099 0.89 CA2 (0.41) CA2CA1MMP1MMP2MMP9
Tetramethylammonium Ion SCHEMBL4802828 0.86 CA2 (0.48) CA2CA1MMP1MMP2MMP9
Tetramethylammonium Ion SCHEMBL8101336 0.86 CA2 (0.48) CA2CA1MMP1MMP2MMP9
Tetramethylammonium Ion SCHEMBL218101 0.84 CA2 (0.46) CA2CA1MMP1MMP2MMP9
SCHEMBL7053425 0.83 CA2 (0.37) CA2CA1MMP1MMP2MMP9
SCHEMBL233556 0.81 CA2 (0.41) CA2CA1MMP1MMP2MMP9
SCHEMBL30145621 0.81 CA2 (0.38) CA2CA1MMP1MMP2MMP9
SCHEMBL4450608 0.81 CA2 (0.35) CA2CA1MMP1MMP2MMP9
SCHEMBL6392842 0.80 CA2 (0.50) CA2CA1MMP1MMP2MMP9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1290106-B1 ANTISTATIC AGENT BAYER MATERIALSCIENCE AG (DE) 2009-08-12 EP claimed
EP-4370334-A1 FILM STRUCTURE SUITABLE FOR RAPID LAMINATION Covestro Deutschland AG (DE) 2024-05-22 EP disclosed
US-11731411-B2 Plastic films for ID documents with better lightness of embossed holograms COVESTRO DEUTSCHLAND AG (DE) 2023-08-22 US disclosed
WO-2023285358-A1 FILM STRUCTURE SUITABLE FOR RAPID LAMINATION COVESTRO DEUTSCHLAND AG (DE) 2023-01-19 WO disclosed
WO-2023285356-A1 SPECIAL POLYMER LAYERS FOR FASTER LAMINABILITY OF MULTILAYER STRUCTURES COVESTRO DEUTSCHLAND AG (DE) 2023-01-19 WO disclosed
EP-4119344-A1 SPECIAL POLYMER LAYERS FOR FASTER LAMINATION OF MULTILAYER STRUCTURES Covestro Deutschland AG (DE) 2023-01-18 EP disclosed
US-20230002553-A1 FILMS HAVING SPECIAL PROPERTIES COVESTRO INTELLECTUAL PROPERTY GMBH & CO. KG (DE) 2023-01-05 US disclosed
EP-3727851-B1 PLASTIC FILMS FOR ID DOCUMENTS WITH IMPRINTED HOLOGRAMS HAVING IMPROVED BRIGHTNESS COVESTRO DEUTSCHLAND AG (DE) 2023-01-04 EP disclosed
US-11198769-B2 Plastic films for ID documents having improved properties for laser engraving and improved chemical resistance COVESTRO DEUTSCHLAND AG (DE) 2021-12-14 US disclosed
US-20210371609-A1 PLASTIC FILMS WITH REDUCED UV ACTIVITY COVESTRO LLC 2021-12-02 US disclosed
EP-3559095-A1 PLASTIC FILMS FOR ID DOCUMENTS HAVING IMPROVED PROPERTIES FOR LASER ENGRAVING AND IMPROVED CHEMICAL RESISTANCE Covestro Deutschland AG (DE) 2019-10-30 EP disclosed
US-10131178-B2 Layered structure and films for ID documents having improved properties for laser engraving COVESTRO DEUTSCHLAND AG (DE) 2018-11-20 US disclosed
US-9079443-B2 ID cards with blocked laser engraving writability BAYER MATERIALSCIENCE AG (DE) 2015-07-14 US disclosed
US-20120001413-A1 LAYER STRUCTURE AND FILMS FOR ID DOCUMENTS HAVING IMPROVED PROPERTIES FOR LASER ENGRAVING BAYER MATERIALSCIENCE AG (DE) 2012-01-05 US disclosed
US-20110206908-A1 USE OF A PLASTIC FILM IN COLOUR LASER PRINTING BAYER MATERIAL SCIENCE AG (DE) 2011-08-25 US disclosed
US-20110200801-A1 ID CARDS WITH BLOCKED LASER ENGRAVING WRITABILITY BAYER MATERIAL SCIENCE AG (DE) 2011-08-18 US disclosed
US-20110193337-A1 FORGERY-PROOF SECURITY FEATURES IN SECURITY OR VALUE DOCUMENTS BAYER MATERIAL SCIENCE AG (DE) 2011-08-11 US disclosed
US-7169333-B2 Antistatic agent BAYER AKTIENGESELLSCHAFT (DE) 2007-01-30 US disclosed
US-20030139503-A1 Antistatic agent COVESTRO DEUTSCHLAND AG (DE) 2003-07-24 US disclosed
US-20030031844-A1 Layer of perfluoroalkyl sulfonic ammonium acid salts, phosphonium acid salts and sulfonium acid salts and polycarbonate (co)polymers BAYER AKTIENGESELLSCHAFT (DE) 2003-02-13 US disclosed