Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.42 |
| ▸ | ALDH2 | P05091 | 2/20 | 0.42 |
| ▸ | CTSD | P07339 | 1/20 | 0.33 |
| ▸ | LMNA | P02545 | 1/20 | 0.33 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.33 |
| ▸ | GLA | P06280 | 1/20 | 0.33 |
| ▸ | POLB | P06746 | 1/20 | 0.33 |
| ▸ | CA12 | O43570 | 2/20 | 0.32 |
| ▸ | CA1 | P00915 | 2/20 | 0.32 |
| ▸ | CA9 | Q16790 | 2/20 | 0.32 |
| ▸ | MMP1 | P03956 | 1/20 | 0.32 |
| ▸ | MMP2 | P08253 | 1/20 | 0.32 |
| ▸ | MMP3 | P08254 | 1/20 | 0.32 |
| ▸ | MMP8 | P22894 | 1/20 | 0.32 |
| ▸ | GAA | P10253 | 1/20 | 0.30 |
| ▸ | CA2 | P00918 | 1/20 | 0.30 |
| ▸ | SHMT2 | P34897 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18641843 | 0.84 | CA12 (0.43) | ALDH1A1ALDH2CTSDLMNACA12 | |
| SCHEMBL6142485 | 0.84 | — | — | |
| SCHEMBL11015503 | 0.82 | CA1 (0.44) | ALDH1A1ALDH2CTSDLMNAKDM4E | |
| SCHEMBL7765563 | 0.78 | ALDH1A1 (0.42) | ALDH1A1ALDH2LMNAKDM4EGLA | |
| SCHEMBL7766497 | 0.77 | ALDH1A1 (0.41) | ALDH1A1ALDH2LMNAKDM4EGLA | |
| SCHEMBL8748175 | 0.75 | CA2 (0.46) | ALDH1A1ALDH2CTSDLMNAPOLB | |
| SCHEMBL2830770 | 0.75 | — | — | |
| SCHEMBL9683654 | 0.74 | ALDH1A1 (0.50) | ALDH1A1ALDH2LMNAKDM4EGLA | |
| SCHEMBL8637059 | 0.72 | — | — | |
| SCHEMBL871699 | 0.72 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2021153608-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION AND METHOD FOR MANUFACTURING CURED RELIEF PATTERN | 旭化成株式会社 | 2021-08-05 | — | — | WO | disclosed |