Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.44 |
| ▸ | IDO1 | P14902 | 1/20 | 0.41 |
| ▸ | RAB9A | P51151 | 4/20 | 0.41 |
| ▸ | NPC1 | O15118 | 3/20 | 0.41 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.41 |
| ▸ | NOTUM | Q6P988 | 1/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.38 |
| ▸ | MEN1 | O00255 | 1/20 | 0.38 |
| ▸ | MAPT | P10636 | 3/20 | 0.36 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.36 |
| ▸ | ATM | Q13315 | 1/20 | 0.36 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.36 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.35 |
| ▸ | NFKB2 | Q00653 | 1/20 | 0.35 |
| ▸ | RELA | Q04206 | 1/20 | 0.35 |
| ▸ | LMNA | P02545 | 2/20 | 0.33 |
| ▸ | GAA | P10253 | 1/20 | 0.33 |
| ▸ | POLB | P06746 | 1/20 | 0.33 |
| ▸ | ADORA3 | P0DMS8 | 1/20 | 0.33 |
| ▸ | ADORA2A | P29274 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1131999 | 0.81 | NPC1 (0.53) | ALDH1A1RAB9ANPC1MAPTLMNA | |
| SCHEMBL12997586 | 0.79 | ALDH1A1 (0.47) | ALDH1A1IDO1RAB9ANPC1MAPK1 | |
| SCHEMBL9658951 | 0.77 | ALDH1A1 (0.44) | ALDH1A1IDO1RAB9ANPC1MAPK1 | |
| SCHEMBL4633787 | 0.74 | MAPT (0.44) | ALDH1A1IDO1RAB9ANPC1MAPK1 | |
| SCHEMBL1132054 | 0.74 | CYP2A6 (0.58) | ALDH1A1IDO1RAB9ANPC1KMT2A | |
| SCHEMBL576916 | 0.73 | ALDH1A1 (0.47) | ALDH1A1IDO1RAB9ANPC1MAPK1 | |
| SCHEMBL1326009 | 0.71 | — | — | |
| Biphenyl SCHEMBL30081431 | 0.69 | ALDH1A1 (0.90) | ALDH1A1RAB9ANPC1MAPK1NOTUM | |
| Biphenyl SCHEMBL29787337 | 0.69 | ALDH1A1 (0.90) | ALDH1A1RAB9ANPC1MAPK1NOTUM | |
| SCHEMBL405762 | 0.67 | ALDH1A1 (0.47) | ALDH1A1RAB9ANPC1MAPK1NOTUM |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 852 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-110283274-A | It can obtain the ArF photoresist and the preparation method and application thereof of 90nm or less Trench and Hole figure | 珠海雅天科技有限公司 | 2019-09-27 | — | — | CN | claimed |
| CN-104837922-A | Resin composition, prepreg, laminate, metal foil-clad laminate, and printed wiring board | MITSUBISHI GAS CHEMICAL CO | 2015-08-12 | — | — | CN | claimed |
| CN-104736588-A | Resin composition, prepreg, laminate, and printed wiring board | MITSUBISHI GAS CHEMICAL CO | 2015-06-24 | — | — | CN | claimed |
| CN-104736589-A | Resin composition, prepreg, laminate, metal foil-clad laminate, and printed wiring board | MITSUBISHI GAS CHEMICAL CO | 2015-06-24 | — | — | CN | claimed |
| CN-104251843-A | Optical waveguide gas-sensitive device, preparation method thereof, measure system and chemical gas detection method | CHINESE ACAD INST CHEMISTRY | 2014-12-31 | — | — | CN | claimed |
| EP-1297021-B1 | MULTIPHOTON PHOTOSENSITIZATION SYSTEM | 3M INNOVATIVE PROPERTIES CO (US) | 2009-03-18 | — | — | EP | claimed |
| US-7381516-B2 | Multiphoton photosensitization system | 3M INNOVATIVE PROPERTIES COMPANY (US) | 2008-06-03 | — | — | US | claimed |
| US-7060419-B2 | Process for producing microfluidic articles | 3M INNOVATIVE PROPERTIES COMPANY (US) | 2006-06-13 | — | — | US | claimed |
| US-7005229-B2 | Multiphoton photosensitization method | 3M INNOVATIVE PROPERTIES COMPANY (US) | 2006-02-28 | — | — | US | claimed |
| EP-1552345-A2 | MULTIPHOTON PHOTOSENSITIZATION METHOD | 3M Innovative Properties Company (US) | 2005-07-13 | — | — | EP | claimed |
| EP-1062546-A1 | PROCESS FOR THE CONTINUOUS LIQUID PROCESSING OF PHOTOSENSITIVE COMPOSITIONS HAVING REDUCED LEVELS OF RESIDUES | E.I. DUPONT DE NEMOURS AND COMPANY (US) | 2000-12-27 | — | — | EP | claimed |
| WO-1999046644-A1 | PROCESS FOR THE CONTINUOUS LIQUID PROCESSING OF PHOTOSENSITIVE COMPOSITIONS HAVING REDUCED LEVELS OF RESIDUES | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1999-09-16 | — | — | WO | claimed |
| EP-0397529-B1 | Photohardenable electrostatic element with improved environmental latitude | DU PONT (US) | 1994-11-23 | — | — | EP | claimed |
| EP-0359934-B1 | Color filter | MATSUSHITA ELECTRIC INDUSTRIAL CO LTD (JP) | 1994-04-06 | — | — | EP | claimed |
| EP-0215453-B1 | PHOTOIMAGING COMPOSITION CONTAINING ADMIXTURE OF LEUCO DYE AND 2,4,5-TRIPHENYLIMIDAZOLYL DIMER | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1989-09-13 | — | — | EP | claimed |
| US-4622286-A | Photoimaging composition containing admixture of leuco dye and 2,4,5-triphenylimidazolyl dimer | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1986-11-11 | — | — | US | claimed |
| US-4517281-A | UNSATURATED MONOMER, POLYMER BINDER DEVELOPERS | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1985-05-14 | — | — | US | claimed |
| US-4485167-A | UNSATURATED MONOMER, BINDER, PHOTOINITIATOR AND NITROGEN CONTAINING COMPOUND | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1984-11-27 | — | — | US | claimed |
| EP-0024629-B1 | PHOTOIMAGING COMPOSITION COMPRISING A 2,4,5-TRIPHENYLIMIDAZOLYL DIMER AND AT LEAST ONE COMPOUND SELECTED FROM THE GROUP CONSISTING OF A LEUCO DYE AND A POLYMERIZABLE ETHYLENICALLY UNSATURATED MONOMER | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1984-01-04 | — | — | EP | claimed |
| EP-0046271-B1 | PHOTOSENSITIVE COMPOSITIONS AND ELEMENTS CONTAINING SUBSTITUTED HYDROXYLAMINE | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1983-10-19 | — | — | EP | claimed |