SCHEMBL237391

SCHEMBL237391

Cc1ccc(S[O])cc1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25880018 0.78 — —
SCHEMBL1816577 0.75 ALDH1A1 (0.52) —
SCHEMBL83853 0.73 ACHE (0.57) —
SCHEMBL12245875 0.73 ACHE (0.57) —
SCHEMBL57311 0.73 ACHE (0.57) —
SCHEMBL11121834 0.73 ACHE (0.57) —
P-Xylene SCHEMBL28153320 0.72 ACHE (0.67) —
P-Xylene SCHEMBL28095547 0.72 ACHE (0.67) —
P-Xylene SCHEMBL28336749 0.71 ACHE (0.80) —
SCHEMBL10011171 0.71 — —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 167 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5578244-A Silacyclohexane compound, a method of preparing it and a liquid crystal composition containing it SHIN-ETSU CHEMICAL CO., LTD. (JP) 1996-11-26 — — US claimed
CN-110603248-B Pyrimidine compounds 大塚制药株式会社 2023-07-04 — — CN disclosed
EP-2550562-B1 PATTERN FORMING METHOD AND RESIST COMPOSITION FUJIFILM CORP (JP) 2021-04-21 — — EP disclosed
EP-2539769-B1 PATTERN FORMING METHOD AND RESIST COMPOSITION FUJIFILM CORP (JP) 2021-04-07 — — EP disclosed
US-10423068-B2 Active-light-sensitive or radiation-sensitive resin composition, active-light-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing electronic device FUJIFILM CORPORATION (JP) 2019-09-24 — — US disclosed
US-20190285983-A1 RADIATION-SENSITIVE RESIN COMPOSITION, ONIUM SALT COMPOUND AND METHOD FOR FORMING RESIST PATTERN JSR CORPORATION (JP) 2019-09-19 — — US disclosed
US-10394127-B2 Pattern forming method and method for manufacturing electronic device FUJIFILM CORPORATION (JP) 2019-08-27 — — US disclosed
US-10234759-B2 Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film and method of forming pattern FUJIFILM CORPORATION (JP) 2019-03-19 — — US disclosed
US-10126653-B2 Pattern forming method and resist composition FUJIFILM CORPORATION (JP) 2018-11-13 — — US disclosed
US-9897922-B2 Method of forming pattern and developer for use in the method FUJIFILM CORPORATION (JP) 2018-02-20 — — US disclosed
EP-2157130-A1 Photosensitive resin composition, color filter and method of producing the same, and solid-state imaging device Fujifilm Corporation (JP) 2010-02-24 — — EP disclosed
EP-2120094-A2 Black photosensitive resin composition, and color filter and method of producing the same Fujifilm Corporation (JP) 2009-11-18 — — EP disclosed
US-20090280416-A1 BLACK PHOTOSENSITIVE RESIN COMPOSITION, AND COLOR FILTER AND METHOD OF PRODUCING THE SAME FUJIFILM CORPORATION (JP) 2009-11-12 — — US disclosed
EP-2112182-A1 Polymerizable composition, light-shielding color filter, black curable composition, light-shielding color filter for solid-state image pickup device and method of producing the same, and solid-state image pickup device FUJIFILM Corporation (JP) 2009-10-28 — — EP disclosed
US-20090236509-A1 PHOTOSENSITIVE RESIN COMPOSITION, LIGHT-SHIELDING COLOR FILTER, METHOD OF PRODUCING THE SAME AND SOLID-STATE IMAGE SENSOR FUJIFILM CORPORATION (JP) 2009-09-24 — — US disclosed
EP-2103966-A2 Photosensitive resin composition, light-shielding color filter, method of producing the same and solid-state image sensor FUJIFILM Corporation (JP) 2009-09-23 — — EP disclosed
EP-2037323-A2 Photosensitive compositions, curable compositions, novel compounds, photopolymerizable compositions, color filters, and planographic printing plate precursors FUJIFILM Corporation (JP) 2009-03-18 — — EP disclosed
US-20090023085-A1 Photosensitive Compositions, Curable Compositions, Novel Compounds, Photopolymerizable Compositions, Color Filters, and Planographic Printing Plate Precursors FUJIFILM CORPORATION (JP) 2009-01-22 — — US disclosed
EP-0589971-A1 COMPOUNDS SMITHKLINE BEECHAM PLC (GB) 1994-04-06 — — EP disclosed
WO-1992022527-A2 3-SUBSTITUTED PYRROLIDINE DERIVATIVES AS CALCIUM CHANNEL ANTAGONISTS SMITHKLINE BEECHAM PLC (GB) 1992-12-23 — — WO disclosed
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