SCHEMBL237473

SCHEMBL237473

[O]CCC12CC3CC(CC(C3)C1)C2

nearest known ligand 0.56

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
GRIN2D O15399 4/20 0.56
GRIN3B O60391 4/20 0.56
GRIN1 Q05586 4/20 0.56
GRIN2A Q12879 4/20 0.56
GRIN2B Q13224 4/20 0.56
GRIN2C Q14957 4/20 0.56
GRIN3A Q8TCU5 4/20 0.56
EPHX2 P34913 7/20 0.45
MEN1 O00255 3/20 0.42
KMT2A Q03164 3/20 0.42
ALDH1A1 P00352 3/20 0.41
TSHR P16473 1/20 0.41
PKM P14618 1/20 0.41
CA12 O43570 1/20 0.41
CA1 P00915 1/20 0.41
CA2 P00918 1/20 0.41
CA9 Q16790 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11697939 0.82 GRIN2D (0.68) GRIN2DGRIN3BGRIN1GRIN2AGRIN2B
SCHEMBL1558863 0.78 GRIN2D (0.56) GRIN2DGRIN3BGRIN1GRIN2AGRIN2B
SCHEMBL236360 0.77 GRIN2D (0.52) GRIN2DGRIN3BGRIN1GRIN2AGRIN2B
SCHEMBL10957944 0.77 GRIN2D (0.76) GRIN2DGRIN3BGRIN1GRIN2AGRIN2B
SCHEMBL1712949 0.75 MAPT (0.48) GRIN2DGRIN3BGRIN1GRIN2AGRIN2B
SCHEMBL9244367 0.72 GRIN2D (0.56) GRIN2DGRIN3BGRIN1GRIN2AGRIN2B
SCHEMBL17348241 0.72 GRIN2D (0.56) GRIN2DGRIN3BGRIN1GRIN2AGRIN2B
SCHEMBL1558931 0.72 GRIN2D (0.56) GRIN2DGRIN3BGRIN1GRIN2AGRIN2B
SCHEMBL771307 0.72 GRIN2D (0.56) GRIN2DGRIN3BGRIN1GRIN2AGRIN2B
SCHEMBL237474 0.72 GRIN2D (0.56) GRIN2DGRIN3BGRIN1GRIN2AGRIN2B

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 340 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118276405-A Composition for forming resist underlayer film comprising reaction product of acid dianhydride 日产化学株式会社 2024-07-02 CN disclosed
CN-117908332-A Composition for forming resist underlayer film containing radical scavenger 日产化学株式会社 2024-04-19 CN disclosed
CN-113383036-B Composition for forming resist underlayer film containing radical scavenger 日产化学株式会社 2024-02-23 CN disclosed
US-11803122-B2 Chemical amplification-type photosensitive composition, photosensitive dry film, production method of patterned resist layer, production method of plated molded article, compound, and production method of compound TOKYO OHKA KOGYO CO., LTD. (JP) 2023-10-31 US disclosed
CN-116806328-A Film-forming composition having multiple bonds 日产化学株式会社 2023-09-26 CN disclosed
CN-116783552-A Resist underlayer film forming composition containing polymer having alicyclic hydrocarbon group 日产化学株式会社 2023-09-19 CN disclosed
CN-116745700-A Composition for forming resist underlayer film comprising reaction product of acid dianhydride 日产化学株式会社 2023-09-12 CN disclosed
US-20230273521-A1 CHEMICALLY AMPLIFIED PHOTOSENTIVE COMPOSITION, PHOTOSENSITIVE DRY FILM, PRODUCTION METHOD OF SUBSTRATE HAVING TEMPLATE FOR PLATING, AND PRODUCTION METHOD OF PLATED ARTICLE TOKYO OHKA KOGYO CO., LTD. (JP) 2023-08-31 US disclosed
WO-2023162552-A1 CHEMICALLY AMPLIFIED POSITIVE PHOTOSENSITIVE COMPOSITION, PRODUCTION METHOD FOR SUBSTRATE WITH TEMPLATE, AND PRODUCTION METHOD FOR PLATED ARTICLE 東京応化工業株式会社 2023-08-31 WO disclosed
WO-2023162551-A1 METHOD FOR PRODUCING PLATED SHAPED ARTICLE 東京応化工業株式会社 2023-08-31 WO disclosed
US-20060258637-A1 Fused polycyclic compounds AJINOMOTO CO. INC (JP) 2006-11-16 US disclosed
EP-1707567-A1 NOVEL FUSED-RING COMPOUND Ajinomoto Co., Inc. (JP) 2006-10-04 EP disclosed
US-20060194789-A1 Fused polycyclic compounds having a heterocyclic ring(s) and pharmaceutical use thereof AJINOMOTO CO., INC. (JP) 2006-08-31 US disclosed
US-20060189597-A1 Lactam compounds and pharmaceutical use thereof AJINOMOTO CO., INC. (JP) 2006-08-24 US disclosed
EP-1683798-A1 NOVEL FUSED POLYCYCLIC COMPOUND HAVING HETEROCYCLE AND MEDICINAL USE THEREOF Ajinomoto Co., Inc. (JP) 2006-07-26 EP disclosed
US-20050272641-A1 Therapeutic agents for diabetes AJINOMOTO CO., INC. (JP) 2005-12-08 US disclosed
EP-1595544-A1 REMEDY FOR DIABETES Ajinomoto Co., Inc. (JP) 2005-11-16 EP disclosed
US-20050186505-A1 Positive resist composition for immersion exposure and method of pattern formation with the same FUJI PHOTO FILM CO., LTD. 2005-08-25 US disclosed
US-20040048847-A1 Lactam compounds and pharmaceutical use thereof AJINOMOTO CO. INC (JP) 2004-03-11 US disclosed
EP-1346993-A1 LACTAM COMPOUNDS AND MEDICINAL USE THEREOF Ajinomoto Co., Inc. (JP) 2003-09-24 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20060258637-A1 Fused polycyclic compounds SLC2A8, SLC2A3, SLC2A4 GRIN2D 3143/4885GRIN3B 2732/4885GRIN1 2594/4885
US-20060189597-A1 Lactam compounds and pharmaceutical use thereof SLC2A4, SLC2A8, SLC2A1 GRIN2D 3336/4885GRIN3B 2248/4885GRIN1 1900/4885
US-20040048847-A1 Lactam compounds and pharmaceutical use thereof SLC2A4, SLC2A8, SLC2A1 GRIN2D 3336/4885GRIN3B 2248/4885GRIN1 1900/4885
US-20060194789-A1 Fused polycyclic compounds having a heterocyclic ring(s) and pharmaceutical use thereof SLC2A4, SLC2A3, SLC2A1 GRIN2D 2957/4885GRIN3B 2538/4885GRIN1 3247/4885
US-20050272641-A1 Therapeutic agents for diabetes GPR119, IAPP, SLC5A2 GRIN2D 4468/4885GRIN3B 2281/4885GRIN1 2497/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.