SCHEMBL237708

SCHEMBL237708

CC1(C)CC2(CC(C)(C)c3cc(O)ccc32)c2ccc(O)cc21

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
OPRM1 P35372 10/20 0.39
CYP3A4 P08684 2/20 0.38
ALDH1A1 P00352 1/20 0.38
LMNA P02545 1/20 0.38
OPRD1 P41143 6/20 0.38
OPRK1 P41145 5/20 0.38
ESR1 P03372 1/20 0.37
ESR2 Q92731 1/20 0.37
MRGPRX2 Q96LB1 2/20 0.36
KDM4E B2RXH2 2/20 0.35
TP53 P04637 2/20 0.35
ALOX15 P16050 2/20 0.35
MTOR P42345 1/20 0.35
CYP1A2 P05177 1/20 0.35
CYP2D6 P10635 1/20 0.35
CYP2C9 P11712 1/20 0.35
CYP2C19 P33261 1/20 0.35
THPO P40225 1/20 0.35
HIF1A Q16665 1/20 0.35
HSD17B10 Q99714 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29914192 1.00 OPRM1 (0.39) OPRM1CYP3A4ALDH1A1LMNAOPRD1
SCHEMBL29900519 0.96 OPRM1 (0.37) OPRM1CYP3A4ALDH1A1LMNAOPRD1
SCHEMBL3264817 0.96 OPRM1 (0.37) OPRM1CYP3A4ALDH1A1LMNAOPRD1
SCHEMBL2003721 0.96 OPRM1 (0.37) OPRM1CYP3A4ALDH1A1LMNAOPRD1
SCHEMBL169731 0.92 OPRM1 (0.39) OPRM1CYP3A4ALDH1A1LMNAOPRD1
SCHEMBL29401440 0.92 OPRM1 (0.39) OPRM1CYP3A4ALDH1A1LMNAOPRD1
SCHEMBL9328056 0.89 OPRM1 (0.35) OPRM1CYP3A4ALDH1A1LMNAOPRD1
SCHEMBL18415542 0.89 MAPT (0.39) OPRM1CYP3A4ALDH1A1LMNAOPRD1
SCHEMBL9721391 0.87 OPRM1 (0.41) OPRM1CYP3A4ALDH1A1LMNAOPRD1
Bicarbonate SCHEMBL7804013 0.85 CYP3A4 (0.41) OPRM1CYP3A4ALDH1A1LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 144 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1300431-B1 Process for the preparation of polyestercarbonates BAYER MATERIALSCIENCE AG (DE) 2004-12-08 EP claimed
US-6734278-B2 MELT ESTER INTERCHANGE BAYER AKTIENGESELLSCHAFT (DE) 2004-05-11 US claimed
EP-1300431-A2 Process for the preparation of polyestercarbonates Bayer Aktiengesellschaft (DE) 2003-04-09 EP claimed
EP-4644131-A1 LAYER STRUCTURE COMPRISING AT LEAST TWO LAYERS HAVING DIFFERENT ENGRAVINGS Covestro Deutschland AG (DE) 2025-11-05 EP disclosed
US-12365775-B2 Process for partial colouring of plastic parts using solid colourants in colour- carrier layers COVESTRO DEUTSCHLAND AG (DE) 2025-07-22 US disclosed
US-20250205963-A1 METHOD FOR PRODUCING A PLASTIC MOLDING tooz technologies GmbH (DE) 2025-06-26 US disclosed
EP-4549163-A2 IMPROVED METHOD FOR PARTIAL COLOURING OF PLASTIC PARTS Covestro Deutschland AG (DE) 2025-05-07 EP disclosed
US-20250091332-A1 FILM STRUCTURE SUITABLE FOR RAPID LAMINATION COVESTRO DEUTSCHLAND AG (DE) 2025-03-20 US disclosed
EP-3840958-B1 IMPROVED METHOD FOR PARTIAL COLOURING OF PLASTIC PARTS COVESTRO DEUTSCHLAND AG (DE) 2025-02-19 EP disclosed
US-12023953-B2 Layer structure with modified structure, and production thereof COVESTRO INTELLECTUAL PROPERTY GMBH & CO. KG (DE) 2024-07-02 US disclosed
US-20240209169-A1 PROCESS FOR PARTIAL COLOURING OF PLASTIC PARTS USING SOLID COLOURANTS IN COLOUR-CARRIER LAYERS COVESTRO DEUTSCHLAND AG (DE) 2024-06-27 US disclosed
WO-2001005866-A1 METHOD FOR PRODUCING MODIFIED POLYCARBONATES BAYER AKTIENGESELLSCHAFT (DE) 2001-01-25 WO disclosed
WO-2001005867-A1 POLYCARBONATE AND MOLDED POLYCARBONATE ARTICLES BAYER AKTIENGESELLSCHAFT (DE) 2001-01-25 WO disclosed
US-6080522-A CONTAINING PHOTORESIST AND POLYMER CLARIANT INTERNAITONAL, LTD. (CH) 2000-06-27 US disclosed
US-6028161-A EXCELLENT TRANSPARENCY, HEAT RESISTANCE AND MECHANICAL PROPERTIES AND A LOW BIREFRINGENCE, MELT FLUIDITY AND MOLDABILITY; AN OPTICAL DISK, LENS AND AN OPTICAL FIBER MITSUI CHEMICALS, INC. (JP) 2000-02-22 US disclosed
EP-0926180-A2 A polycarbonate copolymer and applications thereof Mitsui Chemicals, Inc. (JP) 1999-06-30 EP disclosed
EP-0922998-A1 RADIATION-SENSITIVE RESIST COMPOSITION WITH HIGH HEAT RESISTANCE Clariant International Ltd. (CH) 1999-06-16 EP disclosed
EP-0307951-B1 Light-sensitive resin composition FUJI PHOTO FILM CO LTD (JP) 1994-03-02 EP disclosed
US-4883739-A PHOTORESISTS FUJI PHOTO FILM CO., LTD. (JP) 1989-11-28 US disclosed
EP-0307951-A2 Light-sensitive resin composition FUJI PHOTO FILM CO., LTD. (JP) 1989-03-22 EP disclosed