Tributylmethylammonium

Tributylmethylammonium

SCHEMBL237746

CCCC[N+](C)(CCCC)CCCC.O=S(=O)(O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F

nearest known ligand 0.37

Full drug profile on Sugi Atlas →

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
CA2 P00918 5/20 0.37
CA1 P00915 4/20 0.37
MMP1 P03956 4/20 0.37
MMP2 P08253 4/20 0.37
MMP9 P14780 4/20 0.37
MMP8 P22894 4/20 0.37
MMP13 P45452 4/20 0.37
F2 P00734 4/20 0.34
PRSS1 P07477 4/20 0.34
PRSS2 P07478 4/20 0.34
PRSS3 P35030 4/20 0.34
CES1 P23141 4/20 0.32
EPHX1 P07099 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Tributylmethylammonium SCHEMBL4441612 0.98 CA2 (0.35) CA2CA1MMP1MMP2MMP9
SCHEMBL4625250 0.92 CES1 (0.37) CA2CA1MMP1MMP2MMP9
SCHEMBL4450621 0.90 CA2 (0.39) CA2CA1MMP1MMP2MMP9
Tetrabuthylammonium SCHEMBL237743 0.89 SLC22A1 (0.40) CA2CA1MMP1MMP2MMP9
SCHEMBL238370 0.88 CA2 (0.37) CA2CA1MMP1MMP2MMP9
Tetrabuthylammonium SCHEMBL236852 0.87 SLC22A1 (0.41) CA2CA1MMP1MMP2MMP9
SCHEMBL11757947 0.86 CA2 (0.36) CA2CA1MMP1MMP2MMP9
Tetrapentylammonium SCHEMBL237808 0.85 SLC22A1 (0.40) CA2CA1MMP1MMP2MMP9
SCHEMBL11760122 0.84 DNM1 (0.46) CA2CA1MMP1MMP2MMP9
SCHEMBL11760225 0.84 DNM1 (0.46) CA2CA1MMP1MMP2MMP9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2157134-B1 Films with improved characteristics BAYER MATERIALSCIENCE AG (DE) 2011-10-19 EP claimed
EP-2133203-B1 Multi-layer optical film constructions with improved characteristics and use thereof BAYER MATERIALSCIENCE AG (DE) 2011-01-19 EP claimed
US-20100092755-A1 FILMS HAVING IMPROVED PROPERTIES BAYER MATERIALSCIENCE AG (DE) 2010-04-15 US claimed
EP-1290106-B1 ANTISTATIC AGENT BAYER MATERIALSCIENCE AG (DE) 2009-08-12 EP claimed
US-20030031844-A1 Layer of perfluoroalkyl sulfonic ammonium acid salts, phosphonium acid salts and sulfonium acid salts and polycarbonate (co)polymers BAYER AKTIENGESELLSCHAFT (DE) 2003-02-13 US claimed
EP-4370334-A1 FILM STRUCTURE SUITABLE FOR RAPID LAMINATION Covestro Deutschland AG (DE) 2024-05-22 EP disclosed
US-11731411-B2 Plastic films for ID documents with better lightness of embossed holograms COVESTRO DEUTSCHLAND AG (DE) 2023-08-22 US disclosed
WO-2023285358-A1 FILM STRUCTURE SUITABLE FOR RAPID LAMINATION COVESTRO DEUTSCHLAND AG (DE) 2023-01-19 WO disclosed
US-20230002553-A1 FILMS HAVING SPECIAL PROPERTIES COVESTRO INTELLECTUAL PROPERTY GMBH & CO. KG (DE) 2023-01-05 US disclosed
US-20210371609-A1 PLASTIC FILMS WITH REDUCED UV ACTIVITY COVESTRO LLC 2021-12-02 US disclosed
EP-3707198-B1 PLASTIC FILMS WITH REDUCED UV ACTIVITY COVESTRO DEUTSCHLAND AG (DE) 2021-10-27 EP disclosed
US-20210001614-A1 PLASTIC FILMS FOR ID DOCUMENTS WITH BETTER LIGHTNESS OF EMBOSSED HOLOGRAMS COVESTRO DEUTSCHLAND AG (DE) 2021-01-07 US disclosed
US-9079443-B2 ID cards with blocked laser engraving writability BAYER MATERIALSCIENCE AG (DE) 2015-07-14 US disclosed
US-20120001413-A1 LAYER STRUCTURE AND FILMS FOR ID DOCUMENTS HAVING IMPROVED PROPERTIES FOR LASER ENGRAVING BAYER MATERIALSCIENCE AG (DE) 2012-01-05 US disclosed
US-20110206908-A1 USE OF A PLASTIC FILM IN COLOUR LASER PRINTING BAYER MATERIAL SCIENCE AG (DE) 2011-08-25 US disclosed
US-20110200801-A1 ID CARDS WITH BLOCKED LASER ENGRAVING WRITABILITY BAYER MATERIAL SCIENCE AG (DE) 2011-08-18 US disclosed
US-20100092755-A1 FILMS HAVING IMPROVED PROPERTIES BAYER MATERIALSCIENCE AG (DE) 2010-04-15 US disclosed
US-7169333-B2 Antistatic agent BAYER AKTIENGESELLSCHAFT (DE) 2007-01-30 US disclosed
US-20030139503-A1 Antistatic agent COVESTRO DEUTSCHLAND AG (DE) 2003-07-24 US disclosed
US-20030031844-A1 Layer of perfluoroalkyl sulfonic ammonium acid salts, phosphonium acid salts and sulfonium acid salts and polycarbonate (co)polymers BAYER AKTIENGESELLSCHAFT (DE) 2003-02-13 US disclosed