SCHEMBL23801089

SCHEMBL23801089

OC1(c2ccc3ccc4cccc5ccc2c3c45)c2ccccc2-c2ccccc21

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ CYP1A2 P05177 4/20 0.42
▸ ERBB2 P04626 1/20 0.42
▸ FYN P06241 1/20 0.42
▸ MAOA P21397 1/20 0.42
▸ ACHE P22303 1/20 0.42
▸ AHR P35869 1/20 0.42
▸ ALDH1A1 P00352 7/20 0.41
▸ HSD17B10 Q99714 6/20 0.41
▸ HPGD P15428 6/20 0.41
▸ THRB P10828 2/20 0.41
▸ TSHR P16473 4/20 0.40
▸ CYP3A4 P08684 2/20 0.40
▸ L3MBTL1 Q9Y468 2/20 0.40
▸ TDP1 Q9NUW8 2/20 0.40
▸ CYP1A1 P04798 1/20 0.38
▸ CYP1B1 Q16678 1/20 0.38
▸ MAPK1 P28482 2/20 0.38
▸ ATM Q13315 1/20 0.38
▸ PDK2 Q15119 5/20 0.36
▸ KDM4E B2RXH2 2/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22876056 0.87 CYP1A2 (0.47) CYP1A2ERBB2FYNMAOAACHE
SCHEMBL13044699 0.82 CYP1A2 (0.42) CYP1A2ERBB2FYNMAOAACHE
SCHEMBL22876057 0.82 CYP1A2 (0.42) CYP1A2ERBB2FYNMAOAACHE
SCHEMBL22876001 0.80 SLC6A3 (0.45) CYP1A2ALDH1A1HSD17B10HPGDTHRB
SCHEMBL19395215 0.78 PDK2 (0.46) CYP1A2ERBB2FYNMAOAACHE
SCHEMBL19395217 0.78 PDK2 (0.46) CYP1A2ERBB2FYNMAOAACHE
SCHEMBL14970802 0.77 PDK2 (0.46) ALDH1A1THRBTSHRL3MBTL1TDP1
SCHEMBL27547728 0.77 CYP1A2 (0.40) CYP1A2ERBB2FYNMAOAACHE
SCHEMBL4822724 0.74 SLC6A3 (0.41) CYP1A2ALDH1A1HSD17B10THRBTSHR
SCHEMBL14970792 0.73 PDK2 (0.46) ALDH1A1THRBTSHRL3MBTL1TDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20210278766-A1 COATING-TYPE COMPOSITION FOR FORMING ORGANIC FILM, PATTERNING PROCESS, POLYMER, AND METHOD FOR MANUFACTURING POLYMER SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-09-09 — — US disclosed
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