SCHEMBL23864896

SCHEMBL23864896

CCC(C)(C(=O)Oc1ccc2ccccc2c1)C(C)C

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ PPARG P37231 3/20 0.46
▸ PPARA Q07869 3/20 0.46
▸ KMT2A Q03164 4/20 0.45
▸ MEN1 O00255 3/20 0.45
▸ MAPT P10636 1/20 0.45
▸ TDP1 Q9NUW8 1/20 0.45
▸ RAB9A P51151 1/20 0.43
▸ PTPN7 P35236 1/20 0.42
▸ ESR1 P03372 1/20 0.41
▸ ESR2 Q92731 1/20 0.41
▸ ALDH1A1 P00352 2/20 0.41
▸ L3MBTL1 Q9Y468 1/20 0.41
▸ HSD17B10 Q99714 1/20 0.41
▸ RECQL P46063 1/20 0.41
▸ BCHE P06276 1/20 0.41
▸ NPC1 O15118 1/20 0.40
▸ CASP3 P42574 1/20 0.40
▸ SENP8 Q96LD8 1/20 0.40
▸ SENP7 Q9BQF6 1/20 0.40
▸ SENP6 Q9GZR1 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21659433 0.87 KMT2A (0.44) PPARGPPARAKMT2AMEN1MAPT
SCHEMBL6742426 0.82 KMT2A (0.50) PPARGPPARAKMT2AMEN1MAPT
SCHEMBL25900770 0.80 ELANE (0.50) KMT2AMEN1ESR1ESR2ALDH1A1
SCHEMBL18671922 0.79 KMT2A (0.47) PPARGPPARAKMT2AMEN1MAPT
SCHEMBL24717023 0.79 NPC1 (0.39) KMT2AMEN1RAB9AESR1ESR2
SCHEMBL30339521 0.78 ELANE (0.58) KMT2AMEN1MAPTTDP1RAB9A
SCHEMBL12618375 0.78 ELANE (0.58) KMT2AMEN1MAPTTDP1RAB9A
SCHEMBL12419173 0.78 KMT2A (0.45) PPARGPPARAKMT2AMEN1MAPT
SCHEMBL12970247 0.76 KMT2A (0.42) KMT2AMEN1MAPTESR1ESR2
SCHEMBL14212203 0.75 ALDH1A1 (0.41) PPARGPPARAKMT2AMEN1MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3885378-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMATION METHOD, AND PRODUCTION METHOD FOR ELECTRONIC DEVICE FUJIFILM Corporation (JP) 2021-09-29 — — EP disclosed
Send feedback