Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | P2RX7 | Q99572 | 1/20 | 0.38 |
| ▸ | IDO1 | P14902 | 3/20 | 0.38 |
| ▸ | CA2 | P00918 | 1/20 | 0.38 |
| ▸ | LMNA | P02545 | 1/20 | 0.36 |
| ▸ | GAA | P10253 | 1/20 | 0.36 |
| ▸ | PDK2 | Q15119 | 1/20 | 0.36 |
| ▸ | TDO2 | P48775 | 1/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.35 |
| ▸ | POLB | P06746 | 1/20 | 0.35 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.35 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.35 |
| ▸ | AXL | P30530 | 1/20 | 0.35 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.35 |
| ▸ | KIF11 | P52732 | 1/20 | 0.35 |
| ▸ | ACP3 | P15309 | 1/20 | 0.35 |
| ▸ | CES1 | P23141 | 1/20 | 0.34 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.33 |
| ▸ | MEN1 | O00255 | 1/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.33 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18419809 | 0.85 | P2RX7 (0.41) | P2RX7L3MBTL1 | |
| SCHEMBL4083407 | 0.79 | P2RX7 (0.45) | P2RX7IDO1CA2LMNAGAA | |
| SCHEMBL807279 | 0.77 | P2RX7 (0.48) | P2RX7IDO1CA2LMNAALDH1A1 | |
| SCHEMBL6675162 | 0.76 | LMNA (0.43) | LMNAGAAALDH1A1POLBL3MBTL1 | |
| SCHEMBL6701791 | 0.76 | LMNA (0.43) | LMNAGAAALDH1A1POLBL3MBTL1 | |
| SCHEMBL6675154 | 0.76 | LMNA (0.43) | LMNAGAAALDH1A1POLBL3MBTL1 | |
| SCHEMBL21181653 | 0.74 | P2RX7 (0.40) | P2RX7L3MBTL1 | |
| SCHEMBL7570359 | 0.73 | ACP3 (0.50) | P2RX7IDO1CA2LMNAGAA | |
| SCHEMBL10701887 | 0.73 | P2RX7 (0.39) | P2RX7LMNAALDH1A1POLBTDP1 | |
| SCHEMBL29932861 | 0.73 | P2RX7 (0.46) | P2RX7L3MBTL1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20210302838-A1 | RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2021-09-30 | — | — | US | disclosed |