Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.51 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.47 |
| ▸ | HPGD | P15428 | 1/20 | 0.47 |
| ▸ | ATM | Q13315 | 1/20 | 0.47 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.44 |
| ▸ | LMNA | P02545 | 2/20 | 0.44 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.44 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.42 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.42 |
| ▸ | GAA | P10253 | 1/20 | 0.42 |
| ▸ | BCHE | P06276 | 1/20 | 0.41 |
| ▸ | GLA | P06280 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL23871038 | 0.87 | ALDH1A1 (0.54) | ALDH1A1KDM4EHPGDATML3MBTL1 | |
| SCHEMBL18427273 | 0.84 | ALDH1A1 (0.54) | ALDH1A1KDM4EHPGDATML3MBTL1 | |
| SCHEMBL12363731 | 0.83 | ALDH1A1 (0.56) | ALDH1A1KDM4EHPGDATML3MBTL1 | |
| SCHEMBL23870916 | 0.81 | ALDH1A1 (0.51) | ALDH1A1KDM4EHPGDATML3MBTL1 | |
| SCHEMBL23870870 | 0.81 | ALDH1A1 (0.51) | ALDH1A1KDM4EHPGDATML3MBTL1 | |
| SCHEMBL12986052 | 0.81 | ALDH1A1 (0.54) | ALDH1A1KDM4EHPGDATML3MBTL1 | |
| SCHEMBL26784870 | 0.81 | ALDH1A1 (0.54) | ALDH1A1KDM4EHPGDATML3MBTL1 | |
| SCHEMBL25475327 | 0.81 | ALDH1A1 (0.54) | ALDH1A1KDM4EHPGDATML3MBTL1 | |
| SCHEMBL12985917 | 0.81 | ALDH1A1 (0.54) | ALDH1A1KDM4EHPGDATML3MBTL1 | |
| Hydrochloric Acid SCHEMBL23803399 | 0.79 | ALDH1A1 (0.56) | ALDH1A1KDM4EHPGDATML3MBTL1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11822245-B2 | Resist composition and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-11-21 | — | — | US | disclosed |
| US-11822245-B2 | Resist composition and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-11-21 | — | — | US | disclosed |
| US-20230120132-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-04-20 | — | — | US | disclosed |
| US-20210302837-A1 | RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2021-09-30 | — | — | US | disclosed |