SCHEMBL23870901

SCHEMBL23870901

CC(C)(I)C(=O)OCCN1CCCC1

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 4/20 0.43
MEN1 O00255 2/20 0.43
ALDH1A1 P00352 1/20 0.42
PSMB1 P20618 1/20 0.40
PSMB5 P28074 1/20 0.40
PSMB2 P49721 1/20 0.40
HPGD P15428 1/20 0.39
NPSR1 Q6W5P4 1/20 0.39
BCHE P06276 1/20 0.38
CHRM2 P08172 1/20 0.38
CHRM4 P08173 1/20 0.38
HTR1A P08908 1/20 0.38
CHRM5 P08912 1/20 0.38
ADRA2A P08913 1/20 0.38
CHRM1 P11229 1/20 0.38
ADRA2B P18089 1/20 0.38
ADRA2C P18825 1/20 0.38
CHRM3 P20309 1/20 0.38
DRD1 P21728 1/20 0.38
HRH2 P25021 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23871034 0.98 KMT2A (0.45) KMT2AMEN1ALDH1A1PSMB1PSMB5
SCHEMBL23867008 0.89 MEN1 (0.46) KMT2AMEN1ALDH1A1PSMB1PSMB5
SCHEMBL23870896 0.88 ALDH1A1 (0.55) KMT2AMEN1ALDH1A1NPSR1HTR1B
SCHEMBL9625099 0.85 NPSR1 (0.47) KMT2AMEN1ALDH1A1PSMB1PSMB5
SCHEMBL23870918 0.85 MEN1 (0.42) KMT2AMEN1ALDH1A1CHRM5CHRM3
SCHEMBL23870688 0.85 ALDH1A1 (0.40) KMT2AMEN1ALDH1A1NPSR1BCHE
SCHEMBL23871040 0.85 ATM (0.48) KMT2AMEN1ALDH1A1HPGDBCHE
SCHEMBL23870930 0.84 KMT2A (0.47) KMT2AMEN1ALDH1A1PSMB1PSMB5
SCHEMBL15248890 0.84 KMT2A (0.47) KMT2AMEN1ALDH1A1PSMB1PSMB5
SCHEMBL19432673 0.84 KMT2A (0.47) KMT2AMEN1ALDH1A1PSMB1PSMB5

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11822245-B2 Resist composition and pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-11-21 US disclosed
US-11822245-B2 Resist composition and pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-11-21 US disclosed
US-20210302837-A1 RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-09-30 US disclosed