Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 4/20 | 0.46 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.46 |
| ▸ | GAA | P10253 | 1/20 | 0.46 |
| ▸ | MAPT | P10636 | 1/20 | 0.46 |
| ▸ | KDM4E | B2RXH2 | 6/20 | 0.43 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.43 |
| ▸ | HRH3 | Q9Y5N1 | 1/20 | 0.41 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.39 |
| ▸ | PSMB1 | P20618 | 1/20 | 0.38 |
| ▸ | PSMB5 | P28074 | 1/20 | 0.38 |
| ▸ | PSMB2 | P49721 | 1/20 | 0.38 |
| ▸ | HTT | P42858 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL23871034 | 0.91 | KMT2A (0.45) | MEN1KMT2AMAPTKDM4EALDH1A1 | |
| SCHEMBL23870901 | 0.89 | KMT2A (0.43) | MEN1KMT2AKDM4EALDH1A1HRH3 | |
| SCHEMBL23871241 | 0.85 | KDM4E (0.47) | KDM4EALDH1A1SMN1; SMN2 | |
| SCHEMBL23870896 | 0.78 | ALDH1A1 (0.55) | MEN1KMT2AGAAKDM4EALDH1A1 | |
| SCHEMBL15248890 | 0.77 | KMT2A (0.47) | MEN1KMT2AGAAMAPTKDM4E | |
| SCHEMBL19432673 | 0.77 | KMT2A (0.47) | MEN1KMT2AGAAMAPTKDM4E | |
| SCHEMBL23870930 | 0.77 | KMT2A (0.47) | MEN1KMT2AMAPTALDH1A1SMN1; SMN2 | |
| SCHEMBL24142518 | 0.77 | KDM4E (0.44) | MEN1KMT2AGAAMAPTKDM4E | |
| SCHEMBL23870885 | 0.77 | KMT2A (0.42) | MEN1KMT2AKDM4EALDH1A1PSMB1 | |
| SCHEMBL7750904 | 0.77 | THRB (0.53) | MEN1KMT2AGAAMAPTKDM4E |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11822245-B2 | Resist composition and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-11-21 | — | — | US | disclosed |
| US-11822245-B2 | Resist composition and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-11-21 | — | — | US | disclosed |
| US-20230120132-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-04-20 | — | — | US | disclosed |
| US-20210405528-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2021-12-30 | — | — | US | disclosed |
| US-20210302838-A1 | RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2021-09-30 | — | — | US | disclosed |
| US-20210302837-A1 | RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2021-09-30 | — | — | US | disclosed |