Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPT | P10636 | 2/20 | 0.57 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.56 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.55 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.55 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.54 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.54 |
| ▸ | HTT | P42858 | 1/20 | 0.53 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.52 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.52 |
| ▸ | POLB | P06746 | 1/20 | 0.51 |
| ▸ | LMNA | P02545 | 1/20 | 0.51 |
| ▸ | NPC1 | O15118 | 1/20 | 0.49 |
| ▸ | RAB9A | P51151 | 1/20 | 0.49 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL23870904 | 0.92 | ALDH1A1 (0.59) | MAPTHSD17B10ALDH1A1CHRM1SMN1; SMN2 | |
| SCHEMBL26784996 | 0.87 | MAPT (0.57) | MAPTHSD17B10ALDH1A1CHRM1SMN1; SMN2 | |
| SCHEMBL23870899 | 0.86 | HSD17B10 (0.59) | MAPTHSD17B10ALDH1A1CHRM1SMN1; SMN2 | |
| SCHEMBL7078925 | 0.83 | MAPT (0.63) | MAPTHSD17B10ALDH1A1CHRM1SMN1; SMN2 | |
| SCHEMBL23870887 | 0.81 | CYP1A2 (0.57) | MAPTHSD17B10ALDH1A1CHRM1SMN1; SMN2 | |
| SCHEMBL23870956 | 0.80 | ALDH1A1 (0.59) | MAPTHSD17B10ALDH1A1CHRM1SMN1; SMN2 | |
| SCHEMBL26785029 | 0.78 | CHRM1 (0.57) | MAPTHSD17B10ALDH1A1CHRM1SMN1; SMN2 | |
| SCHEMBL25475182 | 0.78 | ALDH1A1 (0.60) | MAPTHSD17B10ALDH1A1CHRM1SMN1; SMN2 | |
| SCHEMBL6801751 | 0.78 | POLB (0.57) | MAPTHSD17B10ALDH1A1CHRM1HTT | |
| Hydrochloric Acid SCHEMBL6801589 | 0.77 | POLB (0.55) | MAPTHSD17B10ALDH1A1CHRM1SMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11822245-B2 | Resist composition and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-11-21 | — | — | US | disclosed |
| US-11822245-B2 | Resist composition and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-11-21 | — | — | US | disclosed |
| US-20210302837-A1 | RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2021-09-30 | — | — | US | disclosed |