SCHEMBL23870933

SCHEMBL23870933

CC(I)C(=O)OCCN(C(C)C)C(C)C

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CHRM2 P08172 2/20 0.45
CHRM1 P11229 2/20 0.45
CHRM3 P20309 2/20 0.45
MEN1 O00255 1/20 0.34
KMT2A Q03164 1/20 0.34
CHRNB2 P17787 2/20 0.33
CHRNA4 P43681 2/20 0.33
CHRM4 P08173 1/20 0.33
CHRM5 P08912 1/20 0.33
ESR1 P03372 2/20 0.33
ESR2 Q92731 2/20 0.33
KDM4E B2RXH2 1/20 0.32
POLB P06746 1/20 0.32
MCHR1 Q99705 1/20 0.31
LMNA P02545 1/20 0.31
CYP1A2 P05177 1/20 0.31
CYP2D6 P10635 1/20 0.31
LTA4H P09960 1/20 0.31
ALDH1A1 P00352 1/20 0.30
CYP3A4 P08684 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23870845 0.85 CHRNB2 (0.34) CHRM2CHRM1CHRM3CHRNB2CHRNA4
SCHEMBL6422314 0.83 CHRM2 (0.47) CHRM2CHRM1CHRM3MEN1KMT2A
SCHEMBL23867004 0.83 CYP2D6 (0.40) CHRM2CHRM1CHRM3CHRNB2CHRNA4
SCHEMBL23870848 0.81 CHRNB2 (0.39) CHRM2CHRM1CHRM3MEN1KMT2A
SCHEMBL26082967 0.81 CHRNB2 (0.34) CHRM2CHRM1CHRM3CHRNB2CHRNA4
SCHEMBL3137072 0.79 TSHR (0.33) CHRNB2CHRNA4ALDH1A1
SCHEMBL28854975 0.79 CHRM2 (0.45) CHRM2CHRM1CHRM3MEN1KMT2A
SCHEMBL26785111 0.79 CHRM2 (0.45) CHRM2CHRM1CHRM3MEN1KMT2A
SCHEMBL23818603 0.79 CHRM2 (0.45) CHRM2CHRM1CHRM3MEN1KMT2A
SCHEMBL10340378 0.78 CHRM1 (0.47) CHRM2CHRM1CHRM3MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11822245-B2 Resist composition and pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-11-21 US disclosed
US-11822245-B2 Resist composition and pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-11-21 US disclosed
US-20230120132-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-20 US disclosed
US-20210302837-A1 RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-09-30 US disclosed