SCHEMBL23870845

SCHEMBL23870845

CC(I)C(=O)OCCN(CCOC(=O)C(C)I)C(C)C

nearest known ligand 0.34

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
CHRNB2 P17787 4/20 0.34
CHRNA4 P43681 4/20 0.34
CHRM2 P08172 2/20 0.34
CHRM1 P11229 2/20 0.34
CHRM3 P20309 2/20 0.34
CHRM4 P08173 1/20 0.34
CHRM5 P08912 1/20 0.34
LMNA P02545 1/20 0.32
CYP1A2 P05177 1/20 0.32
CYP2D6 P10635 1/20 0.32
ALDH1A1 P00352 2/20 0.31
CYP3A4 P08684 1/20 0.31
SMN1; SMN2 Q16637 1/20 0.31
CHRNB4 P30926 2/20 0.31
CHRNA3 P32297 2/20 0.31
SCN5A Q14524 1/20 0.30
SCN9A Q15858 1/20 0.30
SCN10A Q9Y5Y9 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23870933 0.85 CHRM2 (0.45) CHRNB2CHRNA4CHRM2CHRM1CHRM3
SCHEMBL23867004 0.84 CYP2D6 (0.40) CHRNB2CHRNA4CHRM2CHRM1CHRM3
SCHEMBL23870848 0.83 CHRNB2 (0.39) CHRNB2CHRNA4CHRM2CHRM1CHRM3
SCHEMBL26082967 0.83 CHRNB2 (0.34) CHRNB2CHRNA4CHRM2CHRM1CHRM3
SCHEMBL3137072 0.81 TSHR (0.33) CHRNB2CHRNA4ALDH1A1CHRNB4CHRNA3
SCHEMBL26785071 0.81 CHRM2 (0.33) CHRNB2CHRNA4CHRM2CHRM1CHRM3
SCHEMBL26298066 0.80 ALDH1A1 (0.43) CHRNB2CHRNA4CHRM2CHRM1CHRM3
SCHEMBL23870850 0.79 CYP2D6 (0.47) CHRM2CHRM1CHRM3CHRM4CHRM5
SCHEMBL25142186 0.79 CYP2D6 (0.37) CHRNB2CHRNA4CHRM2CHRM1CHRM3
SCHEMBL26784166 0.79 CYP2D6 (0.51) CHRM2CHRM1CHRM3CHRM4CHRM5

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11822245-B2 Resist composition and pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-11-21 US disclosed
US-11822245-B2 Resist composition and pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-11-21 US disclosed
US-20210302837-A1 RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-09-30 US disclosed