SCHEMBL238951

SCHEMBL238951

C=CC(=O)OCCC1CN1

nearest known ligand 0.50

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
TSHR P16473 7/20 0.50
ALDH1A1 P00352 4/20 0.50
TP53 P04637 3/20 0.50
HIF1A Q16665 3/20 0.50
CYP3A4 P08684 2/20 0.50
HSD17B10 Q99714 1/20 0.50
HPGD P15428 1/20 0.46
THRB P10828 2/20 0.39
MAPK1 P28482 1/20 0.37
SMN1; SMN2 Q16637 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2796353 0.87 TSHR (0.42) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL6525414 0.80
SCHEMBL1783860 0.79 TSHR (0.41) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL11921515 0.76 TSHR (0.54) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL16489120 0.76 TSHR (0.54) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL93462 0.73 TSHR (0.84) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL30604742 0.73 TSHR (0.84) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL20573546 0.73 TSHR (0.50) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL301371 0.73 TSHR (0.50) TSHRALDH1A1TP53HIF1ACYP3A4
Carbon Monoxide SCHEMBL679225 0.72 TSHR (0.73) TSHRALDH1A1TP53HIF1ACYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 37 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110964400-B Aqueous wood lacquer emulsion and preparation method and application thereof 中国科学院化学研究所 2022-01-07 CN claimed
CN-110964400-A Aqueous wood lacquer emulsion and preparation method and application thereof 中国科学院化学研究所 2020-04-07 CN claimed
CN-110964400-B Aqueous wood lacquer emulsion and preparation method and application thereof 中国科学院化学研究所 2022-01-07 CN disclosed
US-9745406-B2 Curable composition CEMEDINE CO., LTD. (JP) 2017-08-29 US disclosed
EP-2412756-B1 CURABLE COMPOSITION CEMEDINE CO LTD (JP) 2016-12-21 EP disclosed
US-8217130-B2 Curable composition and method for producing the same CEMEDINE CO., LTD. (JP) 2012-07-10 US disclosed
EP-2093252-B1 Curing composition and method for producing curing composition CEMEDINE CO LTD (JP) 2012-05-16 EP disclosed
EP-2412756-A1 CURABLE COMPOSITION CEMEDINE CO., LTD. (JP) 2012-02-01 EP disclosed
US-20120004371-A1 CURABLE COMPOSITION CEMEDINE CO., LTD. (JP) 2012-01-05 US disclosed
US-20100267898-A1 CURABLE COMPOSITION AND METHOD FOR PRODUCING THE SAME CEMEDINE CO., LTD. 2010-10-21 US disclosed
EP-1650257-B1 CURING COMPOSITION AND METHOD FOR PRODUCING CURING COMPOSITION CEMEDINE CO LTD (JP) 2010-09-08 EP disclosed
US-6783850-B2 (METH)ACRYLIC ESTER COPOLYMER WITH TACKIFIER RESIN; SOLVENT-FREE SOKEN CHEMICAL & ENGINEERING CO., LTD. (JP) 2004-08-31 US disclosed
US-20040162407-A1 Catalyst for bulk polymerization OKAMOTO SYUJI 2004-08-19 US disclosed
US-20040058266-A1 Toner for developing electrostatic images, process for preparing toner for developing electrostatic images, developer for developing electrostatic images and images forming method FUJI XEROX CO., LTD. (JP) 2004-03-25 US disclosed
US-20030023012-A1 CATALYST FOR BULK POLYMERIZATION SOKEN CHEMICAL & ENGINEERING CO., LTD. 2003-01-30 US disclosed
US-20030008140-A1 Acrylic polymer compositions, acrylic pressure-sensitive adhesion tapes and process for producing the same SOKEN CHEMICAL & ENGINEERING CO., LTD. (JP) 2003-01-09 US disclosed
US-6489412-B1 A CATALYST FOR BULK POLYMERIZATION COMPRISING AN ORGANOMETALLIC COMPOUND REPRESENTED BY SPECIFIED FORMULA AND A THIOL IS PROVIDED. THE SPECIFIED ORGANOMETALLIC COMPOUND IS A METALLOCENE COMPOUND SUCH AS TITANOCENE OR ZIRCONOCENE. SOKEN CHEMICAL & ENGINEERING CO., LTD. (JP) 2002-12-03 US disclosed
EP-0578498-B1 Acrylic polymer, its use and process for producing it NIPPON CATALYTIC CHEM IND (JP) 1997-04-16 EP disclosed
US-5574117-A SULFUR COMPOUND NIPPON SHOKUBAI CO., LTD. (JP) 1996-11-12 US disclosed
EP-0578498-A2 Acrylic polymer, its use and process for producing it NIPPON SHOKUBAI CO., LTD. (JP) 1994-01-12 EP disclosed