SCHEMBL2390126

SCHEMBL2390126

CCCC(=O)Oc1ccccc1-c1ccccc1

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 8/20 0.53
MEN1 O00255 1/20 0.53
RECQL P46063 1/20 0.53
KMT2A Q03164 1/20 0.53
L3MBTL1 Q9Y468 4/20 0.47
TDP1 Q9NUW8 3/20 0.47
LMNA P02545 4/20 0.47
PKM P14618 1/20 0.47
ALDH1A1 P00352 3/20 0.47
SMN1; SMN2 Q16637 3/20 0.47
FABP3 P05413 2/20 0.47
FABP7 O15540 1/20 0.47
FABP5 Q01469 1/20 0.47
MAPK1 P28482 3/20 0.46
HTT P42858 2/20 0.46
USP2 O75604 1/20 0.46
MAPT P10636 1/20 0.46
HPGD P15428 1/20 0.45
POLM Q9NP87 1/20 0.45
POLK Q9UBT6 1/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL34470443 1.00 KDM4E (0.53) KDM4EMEN1RECQLKMT2AL3MBTL1
SCHEMBL16236486 0.90 KDM4E (0.66) KDM4EMEN1RECQLKMT2AL3MBTL1
SCHEMBL27544260 0.89 KDM4E (0.60) KDM4EMEN1RECQLKMT2AALDH1A1
SCHEMBL10449001 0.89 KMT2A (0.46) KDM4EMEN1RECQLKMT2ALMNA
SCHEMBL34470595 0.89 KDM4E (0.60) KDM4EMEN1RECQLKMT2AALDH1A1
SCHEMBL5167656 0.88 POLM (0.60) KDM4EMEN1RECQLKMT2AALDH1A1
SCHEMBL31094341 0.88 POLM (0.60) KDM4EMEN1RECQLKMT2AALDH1A1
SCHEMBL2058257 0.86 KDM4E (0.53) KDM4EMEN1KMT2AL3MBTL1TDP1
SCHEMBL28731739 0.85 ALOX15 (0.45) KDM4EMEN1RECQLKMT2ALMNA
SCHEMBL28008237 0.84 KDM4E (0.46) KDM4EMEN1KMT2AL3MBTL1TDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117683173-A Polymer, resist composition, and pattern forming method 信越化学工业株式会社 2024-03-12 CN disclosed
CN-116774520-A Resist material and pattern forming method 信越化学工业株式会社 2023-09-19 CN disclosed
CN-116774519-A Resist material and pattern forming method 信越化学工业株式会社 2023-09-19 CN disclosed
CN-111187235-B Novel salt compound, chemically amplified resist composition, and pattern forming method 信越化学工业株式会社 2023-06-06 CN disclosed
CN-116136645-A Chemically amplified resist composition and pattern forming method 信越化学工业株式会社 2023-05-19 CN disclosed
US-20120142771-A1 BIPHENYLACETAMIDE DERIVATIVE DAINIPPON SUMITOMO PHARMA CO., LTD. (JP) 2012-06-07 US disclosed
EP-2374790-A1 BIPHENYLACETAMIDE DERIVATIVE Dainippon Sumitomo Pharma Co., Ltd. (JP) 2011-10-12 EP disclosed
US-20110224304-A1 BIPHENYLACETAMIDE DERIVATIVE DAINIPPON SUMITOMO PHARMA CO., LTD. (JP) 2011-09-15 US disclosed
CN-1780822-A Use of derivatives of 2, 4-dihydro- 1,2,4 triazole-3-thione as inhibitors of the enzyme myeloperoxidase (MPO) ASTRAZENECA AB (SE) 2006-05-31 CN disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20120142771-A1 BIPHENYLACETAMIDE DERIVATIVE HRH3, KCNH3, BRPF3 KDM4E 829/4885MEN1 1467/4885RECQL 971/4885
US-20110224304-A1 BIPHENYLACETAMIDE DERIVATIVE HRH3, KCNH3, BRPF3 KDM4E 829/4885MEN1 1467/4885RECQL 971/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.