SCHEMBL2390537

SCHEMBL2390537

CCc1ccc[c]c1N

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4415208 0.83 DAO (0.33)
SCHEMBL3684256 0.79 TLR8 (0.40)
SCHEMBL4064007 0.79
SCHEMBL27928238 0.78
SCHEMBL3684618 0.78 LIPG (0.44)
SCHEMBL6634272 0.77
SCHEMBL27866350 0.77 LMNA (0.34)
SCHEMBL3689601 0.77 LIPG (0.47)
SCHEMBL28041451 0.75 KDM4E (0.36)
SCHEMBL218223 0.74

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 33 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20220202821-A1 SMALL MOLECULE PARG INHIBITORS AND METHODS OF USE THEREOF BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM (US) 2022-06-30 US claimed
US-8012652-B2 Method of forming a thin film pattern and method of fabricating a liquid crystal display device LG DISPLAY CO., LTD. (KR) 2011-09-06 US claimed
US-20080264902-A1 Method of forming a thin film pattern and method of fabricating a liquid crystal display device LG ELECTRONICS INC. (KR) 2008-10-30 US claimed
US-20080173615-A1 Etch resist solution, method of fabricating thin film pattern using the same and method of fabricating an LCD device using the same LG DISPLAY CO., LTD. (KR) 2008-07-24 US claimed
CN-108926522-A A kind of microorganism/vegetable colour composition and preparation method thereof that particulate oxidation graphene is modified 东莞市联洲知识产权运营管理有限公司 2018-12-04 CN disclosed
US-8999918-B2 Bis(fluoroalkyl)-1,4-benzodiazepinone compounds and prodrugs thereof BRISTOL-MYERS SQUIBB COMPANY (US) 2015-04-07 US disclosed
US-20140087992-A1 BIS(FLUOROALKYL)-1,4-BENZODIAZEPINONE COMPOUNDS AND PRODRUGS THEREOF BRISTOL-MYERS SQUIBB COMPANY 2014-03-27 US disclosed
US-8524438-B2 Etch resist solution, method of fabricating thin film pattern using the same and method of fabricating an LCD device using the same LG DISPLAY CO., LTD. (KR) 2013-09-03 US disclosed
US-20120205599-A1 COLOR FILTER AND IMAGE DISPLAY APPARATUS HAVING THE SAME FUJIFILM CORPORATION (JP) 2012-08-16 US disclosed
US-8012652-B2 Method of forming a thin film pattern and method of fabricating a liquid crystal display device LG DISPLAY CO., LTD. (KR) 2011-09-06 US disclosed
US-7662815-B2 Diaryl ether β2 adrenergic receptor agonists THERAVANCE, INC. (US) 2010-02-16 US disclosed
EP-2148673-A1 CINNAMIDE COMPOUNDS FOR DEMENTIA Eisai R&D Management Co., Ltd. (JP) 2010-02-03 EP disclosed
US-6702437-B2 AQUEOUS ALKALINE SOLUBLE POLYMER HAVING CARBON-CARBON DOUBLE BOND SIDE CHAINS, LIGHT-HEAT CONVERTING AGENT AND FREE RADICAL INITIATOR; PLANOGRAPHIC PRINTING PLATE; PRINTING RESISTANCE; STORAGE STABILITY; STRENGTH OF IMAGE PORTION FUJI PHOTO FILM CO., LTD. (JP) 2004-03-09 US disclosed
US-20030146965-A1 AQUEOUS ALKALINE SOLUBLE POLYMER HAVING CARBON-CARBON DOUBLE BOND SIDE CHAINS, LIGHT-HEAT CONVERTING AGENT AND FREE RADICAL INITIATOR; PLANOGRAPHIC PRINTING PLATE; PRINTING RESISTANCE; STORAGE STABILITY; STRENGTH OF IMAGE PORTION FUJI PHOTO FILM CO., LTD. 2003-08-07 US disclosed
EP-1285751-A2 Image recording material FUJI PHOTO FILM CO., LTD. (JP) 2003-02-26 EP disclosed
EP-0924193-B1 Processes for producing optically active 2-amino-1-phenylethanol derivatives DAICEL CHEM (JP) 2003-02-19 EP disclosed
CN-1365025-A Positive imaging material FUJI PHOTO FILM CO LTD (JP) 2002-08-21 CN disclosed
US-6051367-A COMPRISING ONE OR MORE ADDITION-POLYMERIZABLE ETHYLENICALLY UNSATURATED COMPOUNDS AND A SPECIFIC OXIME ETHER COMPOUND; HIGH SENSITIVE TO ACTINIC RAYS RANGING FROM ULTRAVIOLET TO VISIBLE LIGHT, IMPROVED FILM STRENGTH FUJI PHOTO FILM CO., LTD. (JP) 2000-04-18 US disclosed
CN-1119196-A Azo dyestuffs with a chlorotrazine group BAYER AG (DE) 1996-03-27 CN disclosed
CN-1036596-A Reactive dyestuffs, Preparation Method And The Use CIBA GEIGY (CH) 1989-10-25 CN disclosed