SCHEMBL23907105

SCHEMBL23907105

Cc1cc(OC2CCCCO2)c(C)cc1OC1CCCCO1

nearest known ligand 0.46

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
PDE4B Q07343 2/20 0.39
PTPN1 P18031 6/20 0.37
KDM4C Q9H3R0 1/20 0.34
DHFR P00374 1/20 0.34
RAB9A P51151 2/20 0.33
NPC1 O15118 1/20 0.33
HSD11B1 P28845 1/20 0.33
MAPT P10636 2/20 0.32
MEN1 O00255 1/20 0.32
KMT2A Q03164 1/20 0.32
L3MBTL1 Q9Y468 1/20 0.32
HTR2A P28223 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23907077 0.91 PTPN1 (0.37) PDE4BPTPN1KDM4CDHFRRAB9A
SCHEMBL25637155 0.91 PDE4B (0.35) PDE4BPTPN1KDM4CDHFRRAB9A
SCHEMBL12831494 0.88 PDE4B (0.35) PDE4BPTPN1RAB9AHSD11B1MAPT
SCHEMBL818901 0.85 RAB9A (0.44) PDE4BPTPN1RAB9ANPC1MAPT
SCHEMBL7772772 0.85 RAB9A (0.44) PDE4BPTPN1RAB9ANPC1MAPT
SCHEMBL29311949 0.85 PDE4B (0.38) PDE4BPTPN1KDM4CDHFRRAB9A
SCHEMBL29550824 0.82 PTPN1 (0.43) PDE4BPTPN1RAB9AHSD11B1MAPT
SCHEMBL7228738 0.82 PDE4B (0.39) PDE4BPTPN1KDM4CDHFRRAB9A
SCHEMBL17654011 0.82 PTPN1 (0.43) PDE4BPTPN1RAB9AHSD11B1MAPT
SCHEMBL23903768 0.81 PDE4B (0.38) PDE4BPTPN1RAB9ANPC1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11675267-B2 Resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-06-13 US disclosed
US-20210311392-A1 RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2021-10-07 US disclosed