SCHEMBL23907143

SCHEMBL23907143

CCOCOc1ccc(S(=O)(=O)c2ccc(O)cc2)cc1

nearest known ligand 0.59

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
GAA P10253 4/20 0.59
PKM P14618 4/20 0.59
NPSR1 Q6W5P4 2/20 0.54
ELANE P08246 2/20 0.51
ALDH1A1 P00352 4/20 0.49
LTA4H P09960 3/20 0.49
CA12 O43570 1/20 0.46
CA1 P00915 1/20 0.46
CA2 P00918 1/20 0.46
CA7 P43166 1/20 0.46
CA9 Q16790 1/20 0.46
KMT2A Q03164 2/20 0.44
POLB P06746 1/20 0.43
MAPT P10636 1/20 0.43
LMNA P02545 2/20 0.43
L3MBTL1 Q9Y468 1/20 0.43
SMN1; SMN2 Q16637 1/20 0.42
NR5A1 Q13285 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23907075 0.91 GAA (0.57) GAAPKMNPSR1ALDH1A1CA12
SCHEMBL417833 0.88 GAA (0.65) GAAPKMNPSR1ELANEALDH1A1
SCHEMBL1793666 0.88 PKM (0.63) GAAPKMNPSR1ELANEALDH1A1
SCHEMBL10899984 0.87 GAA (0.56) GAAPKMNPSR1ELANEALDH1A1
SCHEMBL9856113 0.86 LTA4H (0.63) LTA4HKMT2ALMNANR5A1
SCHEMBL14227001 0.85 PKM (0.66) GAAPKMNPSR1ELANEALDH1A1
SCHEMBL50786 0.83 PKM (0.58) GAAPKMNPSR1ELANEALDH1A1
SCHEMBL24490513 0.83 PKM (0.58) GAAPKMNPSR1ELANEALDH1A1
SCHEMBL51603 0.81 LTA4H (0.66) GAAPKMNPSR1ELANEALDH1A1
SCHEMBL311853 0.81 LTA4H (0.66) GAAPKMNPSR1ELANEALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11675267-B2 Resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-06-13 US disclosed
US-11675267-B2 Resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-06-13 US disclosed
US-20210311392-A1 RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2021-10-07 US disclosed