Acetic Acid

Acetic Acid

SCHEMBL23929045

CC(=O)O.Cc1ccccc1C(=NO)C(=O)c1ccc(Sc2ccccc2)cc1

nearest known ligand 0.50

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ADRA2AADRA2BADRA2CADRB2AGTR1AVPR1AAVPR1BAVPR2BDKRB2CALCRCHRNA3CHRNB4ESR1ESR2GHSRGNRHRGSC1HSPA8MALT1MC1RMC4RNOS1NOS2NOS3OPRK1OXTRRAMP1RAMP2RAMP3SCN5ASSTR1SSTR2SSTR3SSTR4SSTR5dacAdacBdacCfolPftsImrcAmrcBmrdArplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO

The experimentally established mechanism targets of Acetic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
HPGD P15428 4/20 0.50
ALDH1A1 P00352 1/20 0.50
LMNA P02545 2/20 0.42
L3MBTL1 Q9Y468 2/20 0.42
MAPT P10636 2/20 0.42
MEN1 O00255 1/20 0.42
KMT2A Q03164 1/20 0.42
NPC1 O15118 2/20 0.37
RAB9A P51151 2/20 0.37
SMN1; SMN2 Q16637 1/20 0.37
CTSK P43235 1/20 0.37
CES2 O00748 3/20 0.36
CES1 P23141 3/20 0.36
SIRT1 Q96EB6 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Acetic Acid SCHEMBL23929044 1.00 HPGD (0.50) HPGDALDH1A1LMNAL3MBTL1MAPT
SCHEMBL23877647 0.97 HPGD (0.49) HPGDALDH1A1LMNAL3MBTL1MAPT
SCHEMBL23877646 0.97 HPGD (0.49) HPGDALDH1A1LMNAL3MBTL1MAPT
SCHEMBL17069985 0.97 HPGD (0.49) HPGDALDH1A1LMNAL3MBTL1MAPT
SCHEMBL17069984 0.91 HPGD (0.42) HPGDALDH1A1LMNAL3MBTL1MAPT
SCHEMBL17069986 0.89 LMNA (0.42) HPGDALDH1A1LMNAL3MBTL1MAPT
SCHEMBL17069993 0.87 CDC25B (0.41) HPGDALDH1A1LMNAL3MBTL1MAPT
SCHEMBL17069987 0.84 NPC1 (0.50) HPGDALDH1A1LMNAMAPTMEN1
SCHEMBL16372346 0.83 HPGD (0.47) HPGDALDH1A1LMNAL3MBTL1MAPT
SCHEMBL15829747 0.83 HPGD (0.47) HPGDALDH1A1LMNAL3MBTL1MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-111752098-A Self-luminous photosensitive resin composition, color filter and image display device 常州强力电子新材料股份有限公司 2020-10-09 CN claimed
CN-111752097-A Self-luminous photosensitive resin composition, color filter and image display device 常州强力电子新材料股份有限公司 2020-10-09 CN claimed
CN-111752100-A Photosensitive resin composition containing bisimidazole photoinitiator, application thereof, color filter and image display device 常州强力电子新材料股份有限公司 2020-10-09 CN claimed
CN-111752096-B Photosensitive resin composition for color filter and color filter 常州正洁智造科技有限公司 2022-10-14 CN disclosed
CN-111752091-B Application of HABI mixed photoinitiator in UVLED photocuring 常州正洁智造科技有限公司 2022-09-06 CN disclosed
CN-112835261-B EO/PO modified 9-phenylacridine photosensitizer and application thereof 常州强力电子新材料股份有限公司 2022-06-07 CN disclosed
CN-114326309-A Photosensitive resin composition and application thereof 常州正洁智造科技有限公司 2022-04-12 CN disclosed
CN-111752099-B Photosensitive resin composition, application thereof, color filter and image display device 常州强力电子新材料股份有限公司 2022-03-22 CN disclosed
CN-113929624-A Pyrazoline compound, photosensitive resin composition and patterning method 常州强力电子新材料股份有限公司 2022-01-14 CN disclosed
WO-2021213087-A1 ETHOXY/PROPOXY MODIFIED PYRAZOLINE ORGANIC MATTER, APPLICATION THEREOF, PHOTOCURABLE COMPOSITION, AND PHOTORESIST 常州强力电子新材料股份有限公司 (CN) 2021-10-28 WO disclosed
CN-113527207-A Ethoxy/propoxy modified pyrazoline organic matter, application thereof, photocuring composition and photoresist 常州强力电子新材料股份有限公司 2021-10-22 CN disclosed
CN-111747897-A Hexaarylbisimidazole photoinitiator and application thereof 常州格林感光新材料有限公司 2020-10-09 CN disclosed
CN-111752091-A Application of HABI mixed photoinitiator in UVLED photocuring 常州格林感光新材料有限公司 2020-10-09 CN disclosed
CN-111752098-A Self-luminous photosensitive resin composition, color filter and image display device 常州强力电子新材料股份有限公司 2020-10-09 CN disclosed
CN-111752099-A Photosensitive resin composition, application thereof, color filter and image display device 常州强力电子新材料股份有限公司 2020-10-09 CN disclosed
CN-111752097-A Self-luminous photosensitive resin composition, color filter and image display device 常州强力电子新材料股份有限公司 2020-10-09 CN disclosed
CN-111752100-A Photosensitive resin composition containing bisimidazole photoinitiator, application thereof, color filter and image display device 常州强力电子新材料股份有限公司 2020-10-09 CN disclosed
CN-111752096-A Photosensitive resin composition for color filter and color filter 常州格林感光新材料有限公司 2020-10-09 CN disclosed
CN-111258180-A Hexaarylbisimidazole mixed photoinitiator and application thereof 常州格林感光新材料有限公司 2020-06-09 CN disclosed
CN-111258181-A Hexaarylbisimidazole mixed photoinitiator 常州格林感光新材料有限公司 2020-06-09 CN disclosed