Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TP53 | P04637 | 1/20 | 0.75 |
| ▸ | HBB | P68871 | 1/20 | 0.75 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.75 |
| ▸ | DHFR | P00374 | 1/20 | 0.41 |
| ▸ | MAPT | P10636 | 1/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.30 |
| ▸ | TSHR | P16473 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8579242 | 0.91 | TP53 (0.58) | TP53HBBSMN1; SMN2DHFRALDH1A1 | |
| SCHEMBL10963410 | 0.89 | TP53 (0.86) | TP53HBBSMN1; SMN2DHFRMAPT | |
| SCHEMBL19407057 | 0.89 | TP53 (0.59) | TP53HBBSMN1; SMN2DHFRMAPT | |
| Teroxirone SCHEMBL2097151 | 0.87 | TP53 (1.00) | TP53HBBSMN1; SMN2DHFRMAPT | |
| Teroxirone SCHEMBL2097375 | 0.87 | TP53 (1.00) | TP53HBBSMN1; SMN2DHFRMAPT | |
| Teroxirone SCHEMBL4470513 | 0.87 | TP53 (1.00) | TP53HBBSMN1; SMN2DHFRMAPT | |
| Teroxirone SCHEMBL4932 | 0.87 | TP53 (1.00) | TP53HBBSMN1; SMN2DHFRMAPT | |
| Teroxirone SCHEMBL4452999 | 0.87 | TP53 (1.00) | TP53HBBSMN1; SMN2DHFRMAPT | |
| Teroxirone SCHEMBL4461477 | 0.87 | TP53 (1.00) | TP53HBBSMN1; SMN2DHFRMAPT | |
| Teroxirone SCHEMBL4472568 | 0.87 | TP53 (1.00) | TP53HBBSMN1; SMN2DHFRMAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4012499-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2022-06-15 | — | — | EP | disclosed |
| EP-3974904-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, METHOD FOR FORMING CURED FILM, INTERLAYER INSULATION FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT | Shin-Etsu Chemical Co., Ltd. (JP) | 2022-03-30 | — | — | EP | disclosed |
| EP-3896521-A1 | POLYMER, PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING METHOD, METHOD OF FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT | Shin-Etsu Chemical Co., Ltd. (JP) | 2021-10-20 | — | — | EP | disclosed |