SCHEMBL2394417

SCHEMBL2394417

CN(C)c1ccc(C(C#N)(c2ccc(N(C)C)cc2)c2ccccc2F)cc1

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KCNH2 Q12809 2/20 0.41
MAT2A P31153 1/20 0.41
RAB9A P51151 3/20 0.39
NPC1 O15118 2/20 0.39
RXFP1 Q9HBX9 1/20 0.39
SLC2A1 P11166 1/20 0.39
RELA Q04206 1/20 0.37
ALDH1A1 P00352 7/20 0.36
MAPT P10636 5/20 0.36
APP P05067 1/20 0.36
HSD17B10 Q99714 3/20 0.35
TSHR P16473 2/20 0.35
ALOX15 P16050 1/20 0.35
KMT2A Q03164 4/20 0.35
MEN1 O00255 3/20 0.35
MAPK1 P28482 2/20 0.35
L3MBTL1 Q9Y468 1/20 0.35
KDM4E B2RXH2 2/20 0.34
KCNN4 O15554 2/20 0.33
TDP1 Q9NUW8 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5176916 0.82 KCNH2 (0.46) KCNH2MAT2ARAB9ANPC1RXFP1
SCHEMBL1444191 0.81 KCNN4 (0.49) KCNH2L3MBTL1KCNN4
SCHEMBL2391883 0.81 KCNN4 (0.46) KCNH2ALDH1A1TSHRKCNN4
SCHEMBL1800563 0.79 RELA (0.48) RAB9ANPC1SLC2A1RELAALDH1A1
SCHEMBL7535570 0.78 SLC2A1 (0.54) RAB9ANPC1SLC2A1RELAALDH1A1
SCHEMBL1443478 0.78 KCNN4 (0.51) KCNH2L3MBTL1KCNN4
Dimethylamine SCHEMBL2394420 0.78 KCNN4 (0.41) KCNH2ALDH1A1TSHRKCNN4
SCHEMBL7584721 0.75 SLC2A1 (0.42) KCNH2MAT2ARAB9ANPC1SLC2A1
SCHEMBL5201650 0.73 KMT2A (0.50) KCNH2MAT2ARAB9ANPC1SLC2A1
SCHEMBL11444405 0.69 SLC2A1 (0.44) RAB9ANPC1SLC2A1RELAALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8524438-B2 Etch resist solution, method of fabricating thin film pattern using the same and method of fabricating an LCD device using the same LG DISPLAY CO., LTD. (KR) 2013-09-03 US claimed
US-6309797-B1 CONTAINING OXIDIZER; EXPOSURE TO ACTINIC RADIATION SPECTRA GROUP LIMITED, INC. 2001-10-30 US claimed
US-8524438-B2 Etch resist solution, method of fabricating thin film pattern using the same and method of fabricating an LCD device using the same LG DISPLAY CO., LTD. (KR) 2013-09-03 US disclosed
US-8012652-B2 Method of forming a thin film pattern and method of fabricating a liquid crystal display device LG DISPLAY CO., LTD. (KR) 2011-09-06 US disclosed
US-20080264902-A1 Method of forming a thin film pattern and method of fabricating a liquid crystal display device LG ELECTRONICS INC. (KR) 2008-10-30 US disclosed
US-20080173615-A1 Etch resist solution, method of fabricating thin film pattern using the same and method of fabricating an LCD device using the same LG DISPLAY CO., LTD. (KR) 2008-07-24 US disclosed
US-6479217-B1 PHOTOSENSITIVE RECORDING; APPLYING ACTINIC RADIATION; PHOTOPOLYMERIZATION SPECTRA GROUP LIMITED, INC. 2002-11-12 US disclosed
US-20020160310-A1 Method for producing selectively colorable printing plates SPECTRA GROUP LIMITED, INC. 2002-10-31 US disclosed
US-6309797-B1 CONTAINING OXIDIZER; EXPOSURE TO ACTINIC RADIATION SPECTRA GROUP LIMITED, INC. 2001-10-30 US disclosed