Dimethylamine

Dimethylamine

SCHEMBL2394420

CNC.N#CC(c1ccccc1)(c1ccccc1)c1ccccc1F

nearest known ligand 0.41

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KCNN4 O15554 7/20 0.41
KCNE1 P15382 1/20 0.37
KCNQ1 P51787 1/20 0.37
KIF11 P52732 4/20 0.35
CYP2D6 P10635 2/20 0.34
DRD2 P14416 2/20 0.34
DRD4 P21917 2/20 0.34
OPRM1 P35372 2/20 0.34
DRD3 P35462 2/20 0.34
MLNR O43193 1/20 0.33
NR1I2 O75469 1/20 0.33
ADORA3 P0DMS8 1/20 0.33
TBXA2R P21731 1/20 0.33
CCKBR P32239 1/20 0.33
OPRK1 P41145 1/20 0.33
SLC6A3 Q01959 1/20 0.33
KCNH2 Q12809 1/20 0.33
NR1H4 Q96RI1 1/20 0.33
ADORA2B P29275 1/20 0.33
ADORA1 P30542 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2391883 0.93 KCNN4 (0.46) KCNN4KCNE1KCNQ1KIF11CYP2D6
SCHEMBL1443478 0.86 KCNN4 (0.51) KCNN4KCNE1KCNQ1KIF11CYP2D6
SCHEMBL1444191 0.81 KCNN4 (0.49) KCNN4KCNE1KCNQ1KIF11MLNR
SCHEMBL2394417 0.78 KCNH2 (0.41) KCNN4KCNH2ALDH1A1TSHR
SCHEMBL11008323 0.72 KCNN4 (0.42) KCNN4KCNE1KCNQ1KIF11CYP2D6
SCHEMBL780814 0.71 ACHE (0.36) KCNN4KCNE1KCNQ1CYP3A4ALDH1A1
SCHEMBL30966621 0.71 ACHE (0.36) KCNN4KCNE1KCNQ1CYP3A4ALDH1A1
SCHEMBL1444134 0.71 ATM (0.45) KCNN4CYP2D6DRD2DRD4OPRM1
SCHEMBL11496292 0.69 CYP3A4 (0.36) KCNN4KIF11CYP2D6DRD2DRD4
SCHEMBL2392141 0.69 KCNN4 (0.53) KCNN4KIF11CYP2D6DRD2DRD4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8524438-B2 Etch resist solution, method of fabricating thin film pattern using the same and method of fabricating an LCD device using the same LG DISPLAY CO., LTD. (KR) 2013-09-03 US claimed
US-8524438-B2 Etch resist solution, method of fabricating thin film pattern using the same and method of fabricating an LCD device using the same LG DISPLAY CO., LTD. (KR) 2013-09-03 US disclosed
US-8012652-B2 Method of forming a thin film pattern and method of fabricating a liquid crystal display device LG DISPLAY CO., LTD. (KR) 2011-09-06 US disclosed
US-20080264902-A1 Method of forming a thin film pattern and method of fabricating a liquid crystal display device LG ELECTRONICS INC. (KR) 2008-10-30 US disclosed
US-20080173615-A1 Etch resist solution, method of fabricating thin film pattern using the same and method of fabricating an LCD device using the same LG DISPLAY CO., LTD. (KR) 2008-07-24 US disclosed