SCHEMBL2397501

SCHEMBL2397501

CC(C)CC[Si](OC(C)(C)C)(OC(C)(C)C)OC(C)(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL703375 0.78
SCHEMBL2399341 0.74
SCHEMBL703372 0.73
SCHEMBL704271 0.73
SCHEMBL818484 0.70 LMNA (0.31)
SCHEMBL191827 0.70
SCHEMBL5670639 0.70
SCHEMBL18053519 0.69
Ammonia Solution, Strong SCHEMBL20357888 0.69
SCHEMBL6550139 0.69

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 36 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11033507-B2 Method of synthesis of silica vesicles and use thereof THE UNIVERSITY OF QUEENSLAND (AU) 2021-06-15 US disclosed
US-20180193278-A1 METHOD OF SYNTHESIS OF SILICA VESICLES AND USE THEREOF THE UNIVERSITY OF QUEENSLAND (AU) 2018-07-12 US disclosed
US-8734906-B2 Films and method of production thereof BRISMAT INC. (US) 2014-05-27 US disclosed
US-8283260-B2 Process for restoring dielectric properties AIR PRODUCTS AND CHEMICALS, INC. (US) 2012-10-09 US disclosed
US-20110223329-A1 Films and method of production thereof UNIVERSITY OF QUEENSLAND (AU) 2011-09-15 US disclosed
US-20100041234-A1 Process For Restoring Dielectric Properties AIR PRODUCTS AND CHEMICALS, INC. (US) 2010-02-18 US disclosed
US-20090298671-A1 Compositions for Preparing Low Dielectric Materials Containing Solvents AIR PRODUCTS AND CHEMICALS, INC. (US) 2009-12-03 US disclosed
US-7500397-B2 Activated chemical process for enhancing material properties of dielectric films AIR PRODUCTS AND CHEMICALS, INC. (US) 2009-03-10 US disclosed
US-7482676-B2 Compositions for preparing low dielectric materials AIR PRODUCTS AND CHEMICALS, INC. (US) 2009-01-27 US disclosed
EP-1832351-B1 Low dielectric materials and methods for making same AIR PROD & CHEM (US) 2008-11-12 EP disclosed
US-20060183055-A1 Method for defining a feature on a substrate VERSUM MATERIALS US, LLC 2006-08-17 US disclosed
EP-1691410-A2 Method for defining a feature on a substrate Air Products and Chemicals, Inc. (US) 2006-08-16 EP disclosed
US-20050260420-A1 Low dielectric materials and methods for making same VERSUM MATERIALS US, LLC 2005-11-24 US disclosed
EP-1583141-A2 Solvents and methods using same for removing silicon-containing residues from a substrate AIR PRODUCTS AND CHEMICALS, INC. (US) 2005-10-05 EP disclosed
EP-1577935-A2 Compositions for preparing low dielectric materials containing solvents AIR PRODUCTS AND CHEMICALS, INC. (US) 2005-09-21 EP disclosed
US-20050196974-A1 Compositions for preparing low dielectric materials containing solvents VERSUM MATERIALS US, LLC 2005-09-08 US disclosed
US-20050196535-A1 Solvents and methods using same for removing silicon-containing residues from a substrate AIR PRODUCTS AND CHEMICALS, INC. 2005-09-08 US disclosed
EP-1464410-A1 Low dielectric materials and methods for making same AIR PRODUCTS AND CHEMICALS, INC. (US) 2004-10-06 EP disclosed
US-20040048960-A1 Compositions for preparing low dielectric materials AIR PRODUCTS AND CHEMICALS, INC. 2004-03-11 US disclosed
EP-1376671-A1 Compositions for preparing materials with a low dielectric constant AIR PRODUCTS AND CHEMICALS, INC. (US) 2004-01-02 EP disclosed