SCHEMBL23975665

SCHEMBL23975665

CCOC(=O)C(OCCC(F)(F)C(F)(F)S(=O)(=O)O)(OC(=O)C12CC3C[C@@H](CC(O)(C3)C1)C2)C(F)(F)F

nearest known ligand 0.35

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.35
NPC1 O15118 4/20 0.33
RAB9A P51151 4/20 0.33
NPSR1 Q6W5P4 2/20 0.33
SMN1; SMN2 Q16637 1/20 0.33
GAA P10253 1/20 0.33
ABL1 P00519 1/20 0.33
TSHR P16473 1/20 0.33
RIN1 Q13671 1/20 0.33
L3MBTL1 Q9Y468 1/20 0.32
HSD11B1 P28845 1/20 0.32
LMNA P02545 1/20 0.30
USP2 O75604 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13464644 1.00 ALDH1A1 (0.35) ALDH1A1NPC1RAB9ANPSR1SMN1; SMN2
SCHEMBL18235974 0.91 ALDH1A1 (0.36) ALDH1A1NPC1RAB9ANPSR1SMN1; SMN2
SCHEMBL13464729 0.91 LMNA (0.33) ALDH1A1LMNA
SCHEMBL13447508 0.89 ALDH1A1 (0.37) ALDH1A1NPC1RAB9ANPSR1SMN1; SMN2
SCHEMBL24186261 0.88 ALDH1A1 (0.35) ALDH1A1NPC1RAB9ANPSR1SMN1; SMN2
SCHEMBL24064297 0.86 ALDH1A1 (0.35) ALDH1A1NPC1RAB9ANPSR1SMN1; SMN2
SCHEMBL15183217 0.85 LMNA (0.32) ALDH1A1LMNA
SCHEMBL22446104 0.85 SCN9A (0.33)
SCHEMBL15183242 0.84 LMNA (0.32) ALDH1A1LMNA
SCHEMBL15183171 0.84 CYP17A1 (0.30)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11822241-B2 Salt, acid generator, resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-11-21 US disclosed
US-20210341836-A1 SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2021-11-04 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20210341836-A1 SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN H1-10, H1-0, CHRM1 ALDH1A1 921/4885NPC1 3982/4885RAB9A 653/4885
US-11822241-B2 Salt, acid generator, resist composition and method for producing resist pattern H1-10, H1-0, CHRM1 ALDH1A1 921/4885NPC1 3982/4885RAB9A 653/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.