Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | POLB | P06746 | 1/20 | 0.46 |
| ▸ | HDAC3 | O15379 | 1/20 | 0.39 |
| ▸ | HDAC4 | P56524 | 1/20 | 0.39 |
| ▸ | HDAC7 | Q8WUI4 | 1/20 | 0.39 |
| ▸ | HDAC8 | Q9BY41 | 1/20 | 0.39 |
| ▸ | HDAC6 | Q9UBN7 | 1/20 | 0.39 |
| ▸ | HDAC9 | Q9UKV0 | 1/20 | 0.39 |
| ▸ | HDAC5 | Q9UQL6 | 1/20 | 0.39 |
| ▸ | NCOR2 | Q9Y618 | 1/20 | 0.39 |
| ▸ | THRB | P10828 | 1/20 | 0.38 |
| ▸ | AKT1 | P31749 | 1/20 | 0.35 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.35 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.34 |
| ▸ | TSHR | P16473 | 1/20 | 0.34 |
| ▸ | GAA | P10253 | 1/20 | 0.33 |
| ▸ | TYMS | P04818 | 1/20 | 0.33 |
| ▸ | MAPT | P10636 | 1/20 | 0.33 |
| ▸ | EDNRB | P24530 | 1/20 | 0.33 |
| ▸ | EDNRA | P25101 | 1/20 | 0.33 |
| ▸ | LMNA | P02545 | 2/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL31390251 | 1.00 | POLB (0.46) | POLBHDAC3HDAC4HDAC7HDAC8 | |
| SCHEMBL9610452 | 0.88 | POLB (0.37) | POLBHDAC3HDAC4HDAC7HDAC8 | |
| SCHEMBL12735511 | 0.82 | RET (0.39) | POLBTHRBAKT1TSHRLMNA | |
| SCHEMBL22195126 | 0.82 | THRB (0.36) | POLBTHRBKMT2ACYP1A2MAPT | |
| SCHEMBL25255644 | 0.82 | POLB (0.36) | POLBKMT2AMEN1 | |
| SCHEMBL27777776 | 0.78 | POLB (0.53) | POLBHDAC3HDAC4HDAC7HDAC8 | |
| SCHEMBL7646709 | 0.77 | POLB (0.42) | POLBHDAC3HDAC4HDAC7HDAC8 | |
| SCHEMBL10102819 | 0.77 | MAPT (0.34) | POLBHDAC3HDAC8HDAC6THRB | |
| SCHEMBL12433516 | 0.77 | THRB (0.53) | POLBHDAC3HDAC4HDAC7HDAC8 | |
| SCHEMBL20917779 | 0.76 | POLB (0.52) | POLBHDAC3HDAC4HDAC7HDAC8 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 144 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20190105938-A1 | SECURITY ELEMENTS AND METHOD OF MANUFACTURE THEREOF | DE LA RUE INTERNATIONAL LIMITED (GB) | 2019-04-11 | — | — | US | disclosed |
| CN-105542795-B | Chiral polymerizable liquid crystal composition and its application | 江苏和成新材料有限公司 | 2018-09-04 | — | — | CN | disclosed |
| US-10007178-B2 | Positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-06-26 | — | — | US | disclosed |
| US-10007178-B2 | Positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-06-26 | — | — | US | disclosed |
| US-9869931-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-01-16 | — | — | US | disclosed |
| US-9869931-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-01-16 | — | — | US | disclosed |
| US-9846360-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-12-19 | — | — | US | disclosed |
| US-9846360-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-12-19 | — | — | US | disclosed |
| US-9760010-B2 | Patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-09-12 | — | — | US | disclosed |
| US-9760010-B2 | Patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-09-12 | — | — | US | disclosed |
| CN-101620870-A | Optical information recording medium | SONY CORP | 2010-01-06 | — | — | CN | disclosed |
| CN-101620871-A | Optical information recording medium | SONY CORP | 2010-01-06 | — | — | CN | disclosed |
| US-20090292070-A1 | Material composition and optical elements using the same | OLYMPUS CORPORATION (JP) | 2009-11-26 | — | — | US | disclosed |
| WO-2009134594-A1 | OPTICAL FILMS COMPRISING FLUORENOL (METH)ACRYLATE MONOMER | 3M INNOVATIVE PROPERTIES COMPANY (US) | 2009-11-05 | — | — | WO | disclosed |
| US-20090270576-A1 | OPTICAL FILMS COMPRISING FLUORENOL (METH)ACRYLATE MONOMER | 3M INNOVATIVE PROPERTIES COMPANY | 2009-10-29 | — | — | US | disclosed |
| US-20090270576-A1 | OPTICAL FILMS COMPRISING FLUORENOL (METH)ACRYLATE MONOMER | 3M INNOVATIVE PROPERTIES COMPANY | 2009-10-29 | — | — | US | disclosed |
| US-20090264589-A1 | Material composition and optical elements using the same | OLYMPUS CORPORATION (JP) | 2009-10-22 | — | — | US | disclosed |
| CN-100503733-C | Transparent composite composition | SUMITOMO BAKELITE CO (JP) | 2009-06-24 | — | — | CN | disclosed |
| CN-1606600-A | Transparent composite composition | SUMITOMO BAKELITE CO (JP) | 2005-04-13 | — | — | CN | disclosed |
| US-4122113-A | 9-Fluorenyl acrylates | XEROX CORPORATION (US) | 1978-10-24 | — | — | US | disclosed |