⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28715640 | 0.95 | — | — | |
| Boric Acid SCHEMBL28608745 | 0.84 | — | — | |
| SCHEMBL2877572 | 0.82 | — | — | |
| SCHEMBL1243714 | 0.79 | — | — | |
| SCHEMBL28399254 | 0.79 | — | — | |
| SCHEMBL2404499 | 0.79 | — | — | |
| SCHEMBL406721 | 0.77 | — | — | |
| SCHEMBL11121864 | 0.76 | ALDH1A1 (0.50) | — | |
| SCHEMBL114562 | 0.76 | — | — | |
| SCHEMBL7055047 | 0.74 | DGAT1 (0.37) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 113 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-106315592-A | Synthesis method of novel house-shaped molecules | 安庆师范大学 | 2017-01-11 | — | — | CN | claimed |
| CN-106268711-A | Macrocycle molecule modifies the preparation of nano silicon capillary chromatographic column | 安庆师范大学 | 2017-01-04 | — | — | CN | claimed |
| CN-104971517-B | A kind of medicine chiral separation nanometer chromatographic column and preparation method thereof | 安庆师范学院 | 2016-11-23 | — | — | CN | claimed |
| CN-104971517-A | Novel drug chiral resolution nano chromatographic column and preparation method thereof | UNIV ANQING NORMAL | 2015-10-14 | — | — | CN | claimed |
| CN-1226245-C | Halogenating agent and process for halogenating hydroxyl group | OTSUKA KAGAKU KK (JP) | 2005-11-09 | — | — | CN | claimed |
| CN-1252783-A | Halogenating agent and process for halogenating hydroxyl group | OTSUKA KAGAKU KK (JP) | 2000-05-10 | — | — | CN | claimed |
| US-20260104641-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-04-16 | — | — | US | disclosed |
| EP-4660704-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT | Shin-Etsu Chemical Co., Ltd. (JP) | 2025-12-10 | — | — | EP | disclosed |
| CN-119955091-A | Polymer, positive-type negative-type photosensitive resin composition, pattern forming method, cured film forming method, interlayer insulating film, surface protective film, and electronic component | 信越化学工业株式会社 | 2025-05-09 | — | — | CN | disclosed |
| US-20250068070-A1 | NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING METHOD, METHOD FOR FORMING CURED FILM, INTERLAYER INSULATIVE FILM, SURFACE-PROTECTIVE FILM, AND ELECTRONIC COMPONENT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-02-27 | — | — | US | disclosed |
| CN-119439625-A | Negative photosensitive resin composition, pattern forming method, cured coating film forming method, interlayer insulating film, surface protective film, and electronic component | 信越化学工业株式会社 | 2025-02-14 | — | — | CN | disclosed |
| EP-4502729-A1 | NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING METHOD, METHOD FOR FORMING CURED FILM, INTERLAYER INSULATIVE FILM, SURFACE-PROTECTIVE FILM, AND ELECTRONIC COMPONENT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-02-05 | — | — | EP | disclosed |
| CN-115044040-B | Polyimide-containing polymer, positive photosensitive resin composition, negative photosensitive resin composition, and pattern forming method | 信越化学工业株式会社 | 2024-07-02 | — | — | CN | disclosed |
| CN-1332743-A | Cell adhesion-inhibiting antinflammatory compounds | ABBOTT CO (US) | 2002-01-23 | — | — | CN | disclosed |
| CN-1252783-A | Halogenating agent and process for halogenating hydroxyl group | OTSUKA KAGAKU KK (JP) | 2000-05-10 | — | — | CN | disclosed |
| CN-1046286-C | Novel cephem derivatives | MEIJI SEIKA CO (JP) | 1999-11-10 | — | — | CN | disclosed |
| CN-1209754-A | Perfluoroalkyl-containing metal complexes, its preparing method and use in NMR diagnostics | SCHRING AG (DE) | 1999-03-03 | — | — | CN | disclosed |
| CN-1187487-A | Novel peroxyoxalates derived from hydroxy-hydroperoxides | ATOCHEM NORTH AMERICA ELF (US) | 1998-07-15 | — | — | CN | disclosed |
| CN-1186803-A | Novel bis (mono-and diperoxyoxalates) derived from dihydroperoxides and alkyl and alkylperoxy halooxalates | ATOCHEM NORTH AMERICA ELF (US) | 1998-07-08 | — | — | CN | disclosed |
| CN-1114507-A | Novel cephem derivatives | MEIJI SEIKA CO (JP) | 1996-01-03 | — | — | CN | disclosed |