SCHEMBL24064935

SCHEMBL24064935

O=C(O)C1COC2(O1)C1CC3CC(C1)CC2C3

nearest known ligand 0.36

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
HSD11B1 P28845 6/20 0.34
MEN1 O00255 1/20 0.31
KMT2A Q03164 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25113121 0.80 CHRNB2 (0.34)
SCHEMBL25113122 0.71
SCHEMBL7563171 0.67
SCHEMBL7561224 0.67
SCHEMBL16140254 0.66 HSD11B1 (0.35) HSD11B1MEN1KMT2A
SCHEMBL1030224 0.66 HCRTR2 (0.39)
SCHEMBL2038232 0.66 HCRTR2 (0.39)
SCHEMBL1030223 0.66 HCRTR2 (0.39)
SCHEMBL2936811 0.64 HCRTR2 (0.38)
Acetic Acid SCHEMBL21617326 0.64 HCRTR2 (0.38)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230106095-A1 RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN JSR CORPORATION (JP) 2023-04-06 US disclosed
WO-2021241246-A1 RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN JSR株式会社 2021-12-02 WO disclosed