Cyclohexanone

Cyclohexanone

SCHEMBL240660

CCC(C)=O.O=C1CCCCC1

nearest known ligand 0.55

Full drug profile on Sugi Atlas →

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.55
TRIM24 O15164 2/20 0.55
TRIM33 Q9UPN9 2/20 0.55
TDP1 Q9NUW8 2/20 0.50
FFAR3 O14843 1/20 0.36
CYP1A2 P05177 1/20 0.32
GAA P10253 1/20 0.32
CNR2 P34972 1/20 0.31
SMN1; SMN2 Q16637 1/20 0.31
KMT2A Q03164 1/20 0.30
HTT P42858 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Cycloheptanone SCHEMBL28260320 1.00 ALDH1A1 (0.55) ALDH1A1TRIM24TRIM33TDP1FFAR3
Cyclohexanone SCHEMBL19973161 1.00 ALDH1A1 (0.55) ALDH1A1TRIM24TRIM33TDP1FFAR3
Cyclohexanone SCHEMBL28097133 0.98 ALDH1A1 (0.52) ALDH1A1TRIM24TRIM33TDP1FFAR3
Cyclopentanone SCHEMBL2749777 0.97 ALDH1A1 (0.53) ALDH1A1TRIM24TRIM33TDP1FFAR3
Cyclohexanone SCHEMBL28514640 0.93 ALDH1A1 (0.48) ALDH1A1TRIM24TRIM33TDP1FFAR3
Cyclohexanone SCHEMBL27573382 0.88 ALDH1A1 (0.42) ALDH1A1TRIM24TRIM33TDP1
Cyclopentanone SCHEMBL3625536 0.87 ALDH1A1 (0.58) ALDH1A1TRIM24TRIM33TDP1FFAR3
Cyclohexanone SCHEMBL11783871 0.87 ALDH1A1 (0.58) ALDH1A1TRIM24TRIM33TDP1FFAR3
Cyclohexanone SCHEMBL977979 0.87 ALDH1A1 (0.58) ALDH1A1TRIM24TRIM33TDP1FFAR3
Methyl Isobutyl Ketone SCHEMBL7950016 0.86 ALDH1A1 (0.52) ALDH1A1TRIM24TRIM33TDP1GAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 492 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-112338195-A High-hardness alloy grinding device 江苏南冶智能装备研究院有限公司 2021-02-09 CN claimed
CN-112326295-A Alloy sampling device with high representativeness 江苏南冶智能装备研究院有限公司 2021-02-05 CN claimed
CN-112265341-A High-strength environment-friendly micro-bubble ceramic tile 南京市安尔康环境科技有限公司 2021-01-26 CN claimed
CN-112251107-A Fireproof environment-friendly coating for wall 南京市安尔康环境科技有限公司 2021-01-22 CN claimed
CN-112254763-A Humiture monitoring box with corrosion-resistant surface 南京鹏安智慧科技有限公司 2021-01-22 CN claimed
CN-111097240-A Waste gas purification process 江苏腾龙生物药业有限公司 2020-05-05 CN claimed
CN-107225517-B A kind of leakproof water proof type environmental protection frosted disk and preparation method thereof 江苏锋芒复合材料科技集团有限公司 2019-06-14 CN claimed
CN-109291551-A A kind of aqueous PVC foam material 江苏天泽教育咨询有限公司 2019-02-01 CN claimed
CN-109251566-A A kind of waterproof easy to clean nano material and its preparation process 江苏叙然信息科技有限公司 2019-01-22 CN claimed
CN-109202752-A A kind of machine tooling grinding abrasive disk 扬中市飞宇磨具有限公司 2019-01-15 CN claimed
CN-106543829-A A kind of heat-resistant fireproof nanometer film and preparation method thereof 苏州科胜仓储物流设备有限公司 2017-03-29 CN claimed
CN-103897488-A Ink-jet printer ink for thin-film solar cells and preparation method thereof UNIV ZHONGYUAN TECHNOLOGY 2014-07-02 CN claimed
CN-100359407-C Laminated bilayer light conductor and its preparation method UNIV TIANJIN (CN) 2008-01-02 CN claimed
EP-1640976-B1 Magnetic recording medium FUJIFILM CORP (JP) 2007-12-05 EP claimed
US-7198817-B2 Process for producing magnetic recording medium FUJI PHOTO FILM CO., LTD. (JP) 2007-04-03 US claimed
CN-1725113-A Laminated bilayer light conductor and its preparation method UNIV TIANJIN (CN) 2006-01-25 CN claimed
EP-1516597-A1 DRUG ELUTING STENT Microport Medical (Shanghai) Co., Ltd. (CN) 2005-03-23 EP claimed
US-20040096575-A1 Process for producing magnetic recording medium FUJI PHOTO FILM CO., LTD. 2004-05-20 US claimed
EP-0508617-B1 Magnetic paint material and process for producing the same TODA KOGYO CORP (JP) 1997-02-26 EP claimed
US-5403699-A Applying resist comprising copolymer of alpha-alkyl styrene and alpha haloacrylic ester to substrate, exposing to radiation, developing FUJITSU LIMITED (JP) 1995-04-04 US claimed