SCHEMBL2407786

SCHEMBL2407786

Cl[SiH](Cl)Cl.[Si]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL10633882 0.91
SCHEMBL6892 0.89
SCHEMBL20455819 0.89
SCHEMBL7573200 0.89
Fluoride SCHEMBL27656953 0.80
SCHEMBL9741299 0.80
Arsenic SCHEMBL27952301 0.80
SCHEMBL27719336 0.80
Water SCHEMBL28047574 0.80
Methane SCHEMBL28190917 0.80

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 41 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-102725229-A Flow tube reactor for converting silicon tetrachloride to trichlorosilane EVONIK DEGUSSA GMBH 2012-10-10 CN claimed
US-20020081250-A1 Machine for production of granular silicon LORD LTD LP 2002-06-27 US claimed
CN-122079170-A Method for removing boron and phosphorus impurities in high-purity trichlorosilane 2026-05-26 CN disclosed
CN-119713875-A Trichlorosilane silicon discharging heat exchanger 爱特蓝化学(山东)有限公司 2025-03-28 CN disclosed
CN-119713875-A Trichlorosilane silicon discharging heat exchanger 爱特蓝化学(山东)有限公司 2025-03-28 CN disclosed
CN-222104362-U Trichlorosilane silicon synthesis reaction furnace 内蒙古耀煜新能源科技有限公司 2024-12-03 CN disclosed
CN-222104362-U Trichlorosilane silicon synthesis reaction furnace 内蒙古耀煜新能源科技有限公司 2024-12-03 CN disclosed
CN-218465511-U Trichlorosilane purification device in polycrystalline silicon production process 内蒙古鄂尔多斯多晶硅业有限公司 2023-02-10 CN disclosed
CN-106517094-B The method that purifying has High Purity Hydrogen or high-purity chlorosilane containing phosphorus impurities 新特能源股份有限公司 2019-01-08 CN disclosed
CN-106517094-A Method for purification of high purity hydrogen or high purity chloro-silicane containing phosphorus-containing impurities 新特能源股份有限公司 2017-03-22 CN disclosed
CN-205953538-U Polycrystalline silicon trichlorosilane vaporizer 宜昌南玻硅材料有限公司 2017-02-15 CN disclosed
US-20030067029-A1 Method of forming inside rough and outside smooth HSG electrodes and capacitor structure MICRON TECHNOLOGY, INC. (US) 2003-04-10 US disclosed
EP-0832312-B1 METHOD AND APPARATUS FOR SILICON DEPOSITION IN A FLUIDIZED-BED REACTOR ADVANCED SILICON MATERIALS LLC (US) 2003-01-08 EP disclosed
US-20020081250-A1 Machine for production of granular silicon LORD LTD LP 2002-06-27 US disclosed
US-5810934-A Silicon deposition reactor apparatus ADVANCED SILICON MATERIALS, INC. (US) 1998-09-22 US disclosed
US-5798137-A CHEMICAL VAPOR DEPOSITION ON SEED PARTICLES GENERATED IN REACTOR HAVING INLET ZONE WHERE BEADS ARE MAINTAINED IN SUBMERGED SPOUTED BED, UPPER ZONE WITH BUBBLING FLUIDIZED BED ADVANCED SILICON MATERIALS, INC. (US) 1998-08-25 US disclosed
EP-0832312-A2 METHOD AND APPARATUS FOR SILICON DEPOSITION IN A FLUIDIZED-BED REACTOR Advanced Silicon Materials, Inc. (US) 1998-04-01 EP disclosed
WO-1996041036-A2 METHOD AND APPARATUS FOR SILICON DEPOSITION IN A FLUIDIZED-BED REACTOR ADVANCED SILICON MATERIALS, INC. (US) 1996-12-19 WO disclosed
US-5062386-A Induction heated pancake epitaxial reactor EPITAXY SYSTEMS, INC. (US) 1991-11-05 US disclosed
US-4986971-A FROM SILICON POWDER PRODUCED BY GAS ATOMIZATION OF MOLTEN SILICON ELKEM A/S (NO) 1991-01-22 US disclosed