SCHEMBL24091

SCHEMBL24091

CC(=O)CC(=O)CF

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27658550 0.97
SCHEMBL27740018 0.97
SCHEMBL28067162 0.97
SCHEMBL29913539 0.97
SCHEMBL28828212 0.97
SCHEMBL27918442 0.97
SCHEMBL27612780 0.97
Lindane SCHEMBL8529966 0.87 KDM4E (0.39)
SCHEMBL27851895 0.81
SCHEMBL235434 0.79 KDM4E (0.58)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 125 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114835567-A Preparation method of platinum acetylacetonate and platinum fluoro-acetylacetonate 昆明贵金属研究所 2022-08-02 CN claimed
CN-112029109-B Metal organic framework material with copper-pyrazine ligand regulating pore size, preparation method thereof and application of metal organic framework material in methane purification 陕西师范大学 2022-02-25 CN claimed
CN-109776617-B Acetone coordination binuclear palladium compound and preparation method and application thereof 昆明贵金属研究所 2021-04-27 CN claimed
EP-3727686-A1 MOISTURE-CURING COMPOSITIONS Covestro Deutschland AG (DE) 2020-10-28 EP claimed
EP-3720989-A2 COMPOSITION AND PROCESS FOR SELECTIVELY ETCHING A LAYER COMPRISING AN ALUMINIUM COMPOUND IN THE PRESENCE OF LAYERS OF LOW-K MATERIALS, COPPER AND/OR COBALT BASF SE (DE) 2020-10-14 EP claimed
WO-2019110680-A2 COMPOSITION AND PROCESS FOR SELECTIVELY ETCHING A LAYER COMPRISING AN ALUMINIUM COMPOUND IN THE PRESENCE OF LAYERS OF LOW-K MATERIALS, COPPER AND/OR COBALT BASF SE (DE) 2019-06-13 WO claimed
CN-106554311-B The preparation method of 3- fluoro-alkyl -1- methylpyrazole -4- carboxylic acid 常州市卜弋科研化工有限公司 2019-03-01 CN claimed
CN-108626132-A A kind of long axis fire pump using lubrication new material 贝德科技有限公司 2018-10-09 CN claimed
CN-105008326-B Highly sensitive (methyl) acrylate and radically curing material 株式会社自动网络技术研究所 2018-09-11 CN claimed
CN-108368055-A The preparation method of 3- fluoro-alkyl -1- methylpyrazole -4- carboxylic acids 苏威氟有限公司 2018-08-03 CN claimed
CN-1968751-B Process for halogenation of aromatic compounds SABIC INNOVATIVE PLASTICS IP 2011-08-03 CN claimed
CN-101242914-A Dense fluid composition for removing hardened photoresist, post etch residue and/or bottom antireflective coating ADVANCED TECH MATERIALS (US) 2008-08-13 CN claimed
CN-101198416-A Formulations for cleaning ion-implanted photoresist layers from microelectronic devices ADVANCED TECH MATERIALS (US) 2008-06-11 CN claimed
CN-1968751-A Catalyst composition and process for halogenation of aromatic compounds GEN ELECTRIC (US) 2007-05-23 CN claimed
CN-1894050-A Supercritical fluid-based cleaning compositions and methods ADVANCED TECH MATERIALS (US) 2007-01-10 CN claimed
CN-1606431-A Photoactive lanthanide complexes with phosphine oxides, phosphine oxide-sulfides, pyridine N-oxides, and phosphine oxide-pyridine N-oxides, and devices made with such complexes DU PONT (US) 2005-04-13 CN claimed
EP-0873429-A1 EXTRACTING METALS DIRECTLY FROM METAL OXIDES IDAHO RESEARCH FOUNDATION, INC. (US) 1998-10-28 EP claimed
WO-1998011276-A1 GAS MIXTURE AND METHOD OF DRY ETCHING METALS, IN PARTICULAR COPPER, AT LOW TEMPERATURES Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. (DE) 1998-03-19 WO claimed
WO-1997016575-A9 EXTRACTING METALS DIRECTLY FROM METAL OXIDES 1997-08-07 WO claimed
WO-1997016575-A1 EXTRACTING METALS DIRECTLY FROM METAL OXIDES IDAHO RESEARCH FOUNDATION, INC. (US) 1997-05-09 WO claimed