Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ABCG2 | Q9UNQ0 | 2/20 | 0.47 |
| ▸ | MEN1 | O00255 | 1/20 | 0.44 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.44 |
| ▸ | AKR1C3 | P42330 | 1/20 | 0.42 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.41 |
| ▸ | NFKB2 | Q00653 | 1/20 | 0.41 |
| ▸ | RELA | Q04206 | 1/20 | 0.41 |
| ▸ | RECQL | P46063 | 1/20 | 0.40 |
| ▸ | EGFR | P00533 | 1/20 | 0.39 |
| ▸ | CA1 | P00915 | 1/20 | 0.39 |
| ▸ | CA2 | P00918 | 1/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.38 |
| ▸ | TSHR | P16473 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28178758 | 0.87 | MEN1 (0.44) | ABCG2MEN1KMT2AAKR1C3NFKB1 | |
| SCHEMBL4725824 | 0.85 | MEN1 (0.42) | ABCG2MEN1KMT2AAKR1C3NFKB1 | |
| SCHEMBL4725821 | 0.85 | MEN1 (0.42) | ABCG2MEN1KMT2AAKR1C3NFKB1 | |
| SCHEMBL5606467 | 0.85 | ABCG2 (0.54) | ABCG2MEN1KMT2ACA1CA2 | |
| SCHEMBL5606468 | 0.85 | ABCG2 (0.54) | ABCG2MEN1KMT2ACA1CA2 | |
| SCHEMBL1397476 | 0.84 | ABCG2 (0.53) | ABCG2MEN1KMT2AAKR1C3RECQL | |
| SCHEMBL28732347 | 0.84 | ABCG2 (0.53) | ABCG2MEN1KMT2AAKR1C3RECQL | |
| SCHEMBL28251565 | 0.84 | AKR1C3 (0.43) | ABCG2MEN1KMT2AAKR1C3NFKB1 | |
| SCHEMBL13431366 | 0.83 | MEN1 (0.51) | MEN1KMT2AAKR1C3 | |
| SCHEMBL3227832 | 0.83 | MEN1 (0.51) | MEN1KMT2AAKR1C3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-101194878-B | Compressed powder composition | OREAL | 2012-10-31 | — | — | CN | claimed |
| CN-100339767-C | Resist compositions | WAKO PURE CHEM IND LTD (JP) | 2007-09-26 | — | — | CN | claimed |
| CN-107229185-A | The manufacture method of energy sensitivities composition, solidfied material and solidfied material | 东京应化工业株式会社 | 2017-10-03 | — | — | CN | disclosed |
| CN-105541659-A | Halogenated oxime derivatives and their use as potential acid | CIBA SPECIALTY CHEMICALS HOLDING INC | 2016-05-04 | — | — | CN | disclosed |
| CN-102781911-B | Latent acids and their use | BASF SE | 2015-07-22 | — | — | CN | disclosed |
| CN-102186815-B | Sulfonium derivatives and the use therof as latent acids | BASF SE | 2014-07-30 | — | — | CN | disclosed |
| CN-101522613-B | Sulphonium salt photoinitiators | CIBA HOLDING INC | 2013-03-06 | — | — | CN | disclosed |
| EP-2539316-A1 | LATENT ACIDS AND THEIR USE | BASF SE (DE) | 2013-01-02 | — | — | EP | disclosed |
| CN-102781911-A | Latent acids and their use | BASF SE | 2012-11-14 | — | — | CN | disclosed |
| CN-101194878-B | Compressed powder composition | OREAL | 2012-10-31 | — | — | CN | disclosed |
| CN-102186815-A | Sulfonium derivatives and the use therof as latent acids | BASF SE | 2011-09-14 | — | — | CN | disclosed |
| CN-100338056-C | Substituted oxime derivatives and their use as latent acids | LIBA SPECIALTY CHEMICALS HOLDI (CH) | 2007-09-19 | — | — | CN | disclosed |
| CN-1751269-A | Halogenated oxime derivatives and their use as latent acids | CIBA SC HOLDING AG (CH) | 2006-03-22 | — | — | CN | disclosed |
| CN-1662853-A | Onium salts and their use as latent acids | CIBA SC HOLDING AG (CH) | 2005-08-31 | — | — | CN | disclosed |
| CN-1633628-A | Resist compositions | WAKO PURE CHEM IND LTD (JP) | 2005-06-29 | — | — | CN | disclosed |
| CN-1592738-A | Bismide compound, acid generator and resist composition each containing the same, and method of forming pattern from the composition | WAKO PURE CHEM IND LTD (JP) | 2005-03-09 | — | — | CN | disclosed |
| CN-1512990-A | Substituted oxime derivatives and their use as latent acids | �������⻯ѧƷ�ع�����˾ | 2004-07-14 | — | — | CN | disclosed |
| CN-1145078-C | Polymer and resist material | ������ҩ��ҵ��ʽ���� | 2004-04-07 | — | — | CN | disclosed |
| US-6013411-A | PHOTOSENSITIVE COMPOSITION WITH HOMO OR COPOLYCARBONS, HALOGENIUM COMPOUNDS AND SULFONIUM COMPOUNDS | FUJI PHOTO FILM CO., LTD. (JP) | 2000-01-11 | — | — | US | disclosed |
| CN-1159453-A | Polymer and resist material | WAKO PURE CHEM IND LTD (JP) | 1997-09-17 | — | — | CN | disclosed |