Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MTNR1A | P48039 | 4/20 | 0.36 |
| ▸ | MTNR1B | P49286 | 4/20 | 0.36 |
| ▸ | ELANE | P08246 | 1/20 | 0.33 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.31 |
| ▸ | F13A1 | P00488 | 1/20 | 0.30 |
| ▸ | TGM2 | P21980 | 1/20 | 0.30 |
| ▸ | TGM1 | P22735 | 1/20 | 0.30 |
| ▸ | LMNA | P02545 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL24110736 | 0.88 | MTNR1A (0.40) | MTNR1AMTNR1BELANEKDM4ELMNA | |
| SCHEMBL24110721 | 0.81 | MTNR1A (0.39) | MTNR1AMTNR1BELANEKDM4ELMNA | |
| SCHEMBL24110661 | 0.80 | TNFSF11 (0.45) | — | |
| SCHEMBL24106124 | 0.80 | MTNR1A (0.36) | MTNR1AMTNR1BELANE | |
| SCHEMBL24110532 | 0.78 | MTNR1A (0.38) | MTNR1AMTNR1BELANE | |
| SCHEMBL24110777 | 0.76 | MTNR1A (0.40) | MTNR1AMTNR1BELANEKDM4EF13A1 | |
| SCHEMBL24110688 | 0.75 | MTNR1A (0.40) | MTNR1AMTNR1BELANEKDM4E | |
| SCHEMBL24110752 | 0.73 | MTNR1A (0.34) | MTNR1AMTNR1BELANE | |
| SCHEMBL22991575 | 0.71 | ELANE (0.38) | MTNR1AMTNR1BELANE | |
| SCHEMBL17410782 | 0.70 | MTNR1A (0.47) | MTNR1AMTNR1BELANEKDM4E |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11815813-B2 | Compound, resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-11-14 | — | — | US | disclosed |
| US-11815813-B2 | Compound, resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-11-14 | — | — | US | disclosed |
| US-20210389672-A1 | COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2021-12-16 | — | — | US | disclosed |