SCHEMBL24110736

SCHEMBL24110736

COc1cc(OC(=O)OC(C)(C)C)c(I)c(OC(=O)OC(C)(C)C)c1C=O

nearest known ligand 0.40

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
▸ MTNR1A P48039 5/20 0.40
▸ MTNR1B P49286 5/20 0.40
▸ ERN1 O75460 3/20 0.36
▸ LMNA P02545 1/20 0.36
▸ ELANE P08246 1/20 0.33
▸ KDM4E B2RXH2 3/20 0.32
▸ ALDH1A1 P00352 3/20 0.32
▸ TDP1 Q9NUW8 2/20 0.32
▸ TSHR P16473 1/20 0.32
▸ MEN1 O00255 1/20 0.32
▸ CYP3A4 P08684 1/20 0.32
▸ MAPT P10636 1/20 0.32
▸ CASP1 P29466 1/20 0.32
▸ KMT2A Q03164 1/20 0.32
▸ NFE2L2 Q16236 1/20 0.31
▸ STING1 Q86WV6 1/20 0.31
▸ SMN1; SMN2 Q16637 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24110670 0.88 MTNR1A (0.36) MTNR1AMTNR1BLMNAELANEKDM4E
SCHEMBL24110721 0.82 MTNR1A (0.39) MTNR1AMTNR1BERN1LMNAELANE
SCHEMBL24110701 0.79 TNFSF11 (0.46) ERN1LMNAKDM4EALDH1A1TDP1
SCHEMBL24110746 0.79 ELANE (0.34) MTNR1AMTNR1BELANE
SCHEMBL24106124 0.78 MTNR1A (0.36) MTNR1AMTNR1BELANE
SCHEMBL24110532 0.76 MTNR1A (0.38) MTNR1AMTNR1BELANE
SCHEMBL27426728 0.76 ELANE (0.39) MTNR1AMTNR1BELANEKDM4EALDH1A1
SCHEMBL24110735 0.76 ALDH1A1 (0.47) MTNR1AMTNR1BERN1LMNAELANE
SCHEMBL27426726 0.75 ALDH1A1 (0.40) MTNR1AMTNR1BKDM4EALDH1A1TDP1
SCHEMBL24110750 0.73 ELANE (0.32) ELANE

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11815813-B2 Compound, resin, resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-11-14 — — US disclosed
US-11815813-B2 Compound, resin, resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-11-14 — — US disclosed
US-20210389672-A1 COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2021-12-16 — — US disclosed
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