SCHEMBL24110762

SCHEMBL24110762

COc1c(I)cc(O)c(O)c1I

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ TPMT P51580 2/20 0.47
▸ TDP1 Q9NUW8 2/20 0.43
▸ TTR P02766 1/20 0.37
▸ MAPT P10636 2/20 0.37
▸ CYP3A4 P08684 2/20 0.37
▸ PTGS2 P35354 1/20 0.34
▸ ALOX5 P09917 3/20 0.34
▸ ADRB2 P07550 1/20 0.34
▸ ADRB1 P08588 1/20 0.34
▸ ADRB3 P13945 1/20 0.34
▸ TBXA2R P21731 1/20 0.34
▸ PDE4B Q07343 2/20 0.33
▸ KDM4E B2RXH2 2/20 0.33
▸ POLB P06746 2/20 0.33
▸ GAA P10253 2/20 0.33
▸ LMNA P02545 1/20 0.33
▸ NFKB1 P19838 1/20 0.33
▸ XDH P47989 1/20 0.33
▸ GFER P55789 1/20 0.33
▸ NFKB2 Q00653 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24110793 0.78 TPMT (0.43) TPMTTDP1TTRMAPTCYP3A4
SCHEMBL6731780 0.75 TPMT (0.41) TPMTTDP1TTRMAPTCYP3A4
SCHEMBL24110741 0.75 MGAM (0.39) TPMTTDP1MAPTCYP3A4ALOX5
SCHEMBL24110544 0.75 MCL1 (0.39) TPMTTDP1TTRMAPTCYP3A4
SCHEMBL24106350 0.75 TPMT (0.45) TPMTTDP1TTRMAPTCYP3A4
SCHEMBL24110760 0.74 TPMT (0.51) TPMTTDP1MAPTPDE4BKDM4E
SCHEMBL16993817 0.72 MAPT (0.45) TPMTTDP1MAPTCYP3A4PTGS2
SCHEMBL6815825 0.72 GPR35 (0.46) TPMTTDP1TTRMAPTKDM4E
SCHEMBL15360551 0.71 TTR (0.41) TPMTTDP1TTRMAPTKDM4E
SCHEMBL24110787 0.70 TPMT (0.47) TPMTTDP1MAPTCYP3A4PDE4B

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11815813-B2 Compound, resin, resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-11-14 — — US disclosed
US-11815813-B2 Compound, resin, resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-11-14 — — US disclosed
US-20210389672-A1 COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2021-12-16 — — US disclosed
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