SCHEMBL24110760

SCHEMBL24110760

COc1c(I)cc(O)c(OC(C)=O)c1I

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ TPMT P51580 4/20 0.51
▸ ABCB11 O95342 1/20 0.41
▸ TDP1 Q9NUW8 1/20 0.39
▸ PDE4A P27815 1/20 0.39
▸ PDE4B Q07343 1/20 0.39
▸ PDE4C Q08493 1/20 0.39
▸ PDE4D Q08499 1/20 0.39
▸ KDM4E B2RXH2 1/20 0.38
▸ TP53 P04637 1/20 0.38
▸ GAA P10253 1/20 0.38
▸ MAPT P10636 1/20 0.38
▸ HTT P42858 1/20 0.38
▸ HSD17B10 Q99714 1/20 0.38
▸ GRIN2D O15399 1/20 0.37
▸ GRIN3B O60391 1/20 0.37
▸ GRIN1 Q05586 1/20 0.37
▸ GRIN2A Q12879 1/20 0.37
▸ GRIN2B Q13224 1/20 0.37
▸ GRIN2C Q14957 1/20 0.37
▸ GRIN3A Q8TCU5 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24110787 0.86 TPMT (0.47) TPMTABCB11TDP1PDE4APDE4B
SCHEMBL24106257 0.81 ABCB11 (0.43) TPMTABCB11PDE4APDE4BPDE4C
SCHEMBL24110758 0.80 TPMT (0.45) TPMTTDP1DRD2
SCHEMBL24110488 0.78 MCL1 (0.38) TPMTABCB11PDE4APDE4BPDE4C
SCHEMBL24106161 0.78 ABCB11 (0.37) TPMTABCB11PDE4APDE4BPDE4C
SCHEMBL24110496 0.76 ABCB11 (0.36) TPMTABCB11PDE4APDE4BPDE4C
SCHEMBL24110762 0.74 TPMT (0.47) TPMTTDP1PDE4APDE4BPDE4C
SCHEMBL24110785 0.72 MAPT (0.52) TPMTGAAMAPTGRIN2DGRIN3B
SCHEMBL24106111 0.72 MAPT (0.38) TPMTABCB11MAPTGRIN2DGRIN3B
SCHEMBL8081555 0.72 TDP1 (0.58) TPMTABCB11TDP1KDM4ETP53

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11815813-B2 Compound, resin, resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-11-14 — — US disclosed
US-11815813-B2 Compound, resin, resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-11-14 — — US disclosed
US-20210389672-A1 COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2021-12-16 — — US disclosed
Send feedback