SCHEMBL24176809

SCHEMBL24176809

CCOc1ccc2cc(C(=O)c3cc4ccc(OCC)cc4oc3=O)c(=O)oc2c1

nearest known ligand 0.81

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 6/20 0.81
RAB9A P51151 2/20 0.81
SMN1; SMN2 Q16637 1/20 0.81
KDM4E B2RXH2 4/20 0.71
GLA P06280 3/20 0.64
GAA P10253 3/20 0.64
HPGD P15428 3/20 0.64
TP53 P04637 1/20 0.64
MAPT P10636 1/20 0.64
MAPK1 P28482 1/20 0.64
HSD17B10 Q99714 1/20 0.64
MAOB P27338 9/20 0.62
CA9 Q16790 3/20 0.62
CA12 O43570 2/20 0.62
CA4 P22748 2/20 0.62
CA6 P23280 2/20 0.62
CA7 P43166 2/20 0.62
CA14 Q9ULX7 2/20 0.62
CA2 P00918 1/20 0.62
CA3 P07451 1/20 0.62

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17704676 0.90 ALDH1A1 (0.75) ALDH1A1RAB9ASMN1; SMN2KDM4EGLA
SCHEMBL22059557 0.90 ALDH1A1 (0.72) ALDH1A1RAB9ASMN1; SMN2KDM4EGLA
SCHEMBL24176813 0.88 MAOB (0.76) ALDH1A1RAB9ASMN1; SMN2KDM4EGLA
SCHEMBL24176814 0.88 ALDH1A1 (0.82) ALDH1A1RAB9ASMN1; SMN2KDM4EGLA
SCHEMBL11096762 0.86 ALDH1A1 (0.79) ALDH1A1RAB9ASMN1; SMN2KDM4EGLA
SCHEMBL23212920 0.85 ALDH1A1 (0.65) ALDH1A1RAB9ASMN1; SMN2KDM4EGLA
SCHEMBL29851566 0.85 ALDH1A1 (0.65) ALDH1A1RAB9ASMN1; SMN2KDM4EGLA
Ethoxycoumarin SCHEMBL9111482 0.84 MAOB (0.62) ALDH1A1RAB9ASMN1; SMN2KDM4EGLA
SCHEMBL23239275 0.84 ALDH1A1 (0.64) ALDH1A1RAB9ASMN1; SMN2KDM4EGLA
SCHEMBL52650 0.84 ALDH1A1 (0.81) ALDH1A1RAB9AKDM4EGLAGAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230229084-A1 CHEMICALLY AMPLIFIED PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE DRY FILM, PRODUCTION METHOD OF SUBSTRATE HAVING TEMPLATE FOR PLATING, AND PRODUCTION METHOD OF PLATED ARTICLE TOKYO OHKA KOGYO CO., LTD. (JP) 2023-07-20 US disclosed
US-20230229084-A1 CHEMICALLY AMPLIFIED PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE DRY FILM, PRODUCTION METHOD OF SUBSTRATE HAVING TEMPLATE FOR PLATING, AND PRODUCTION METHOD OF PLATED ARTICLE TOKYO OHKA KOGYO CO., LTD. (JP) 2023-07-20 US disclosed
WO-2022004290-A1 CHEMICALLY AMPLIFIED PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE DRY FILM, METHOD FOR MANUFACTURING PLATING MOLD-ATTACHED SUBSTRATE, AND METHOD FOR MANUFACTURING PLATED OBJECT 東京応化工業株式会社 2022-01-06 WO disclosed