Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ATM | Q13315 | 1/20 | 0.70 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.64 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.64 |
| ▸ | HPGD | P15428 | 1/20 | 0.64 |
| ▸ | EPHX2 | P34913 | 6/20 | 0.58 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.58 |
| ▸ | GAA | P10253 | 3/20 | 0.56 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.55 |
| ▸ | PKM | P14618 | 1/20 | 0.53 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.52 |
| ▸ | LMNA | P02545 | 1/20 | 0.52 |
| ▸ | MEN1 | O00255 | 1/20 | 0.51 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL24177836 | 0.86 | ATM (0.71) | ATMKDM4EALDH1A1HPGDEPHX2 | |
| SCHEMBL501199 | 0.84 | ATM (0.73) | ATMKDM4EALDH1A1HPGDSMN1; SMN2 | |
| SCHEMBL24177773 | 0.84 | ATM (0.77) | ATMKDM4EALDH1A1HPGDSMN1; SMN2 | |
| SCHEMBL12125739 | 0.83 | ALDH1A1 (0.63) | ALDH1A1EPHX2SMN1; SMN2GAAL3MBTL1 | |
| SCHEMBL24177759 | 0.82 | ATM (0.67) | ATMKDM4EALDH1A1HPGDSMN1; SMN2 | |
| SCHEMBL11201848 | 0.82 | ATM (1.00) | ATMKDM4EALDH1A1HPGDSMN1; SMN2 | |
| Hydrochloric Acid SCHEMBL7934856 | 0.82 | ALDH1A1 (0.65) | ALDH1A1EPHX2L3MBTL1KMT2ALMNA | |
| SCHEMBL11081554 | 0.81 | ATM (0.97) | ATMKDM4EALDH1A1HPGDSMN1; SMN2 | |
| SCHEMBL8489898 | 0.81 | ATM (0.77) | ATMKDM4EALDH1A1HPGDSMN1; SMN2 | |
| SCHEMBL5925536 | 0.81 | ATM (0.77) | ATMKDM4EALDH1A1HPGDSMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230152692-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-18 | — | — | US | disclosed |
| US-20220004101-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2022-01-06 | — | — | US | disclosed |