SCHEMBL2418010

SCHEMBL2418010

[SiH3]C([SiH3])CCSSSSCCC([SiH3])[SiH3]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21925178 0.66 THRB (0.32)
SCHEMBL21879782 0.60
SCHEMBL21694474 0.55
SCHEMBL1902455 0.46
SCHEMBL2876584 0.43
SCHEMBL15122183 0.43
SCHEMBL233695 0.39
SCHEMBL14236523 0.36
SCHEMBL2565782 0.36
SCHEMBL19658328 0.35

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20110314821-A1 Flow-Through Substrates and Methods for Making and Using Them CORNING INCORPORATED 2011-12-29 US disclosed
US-20110247312-A1 Coated Flow-Through Substrates and Methods for Making and Using Them CORNING INCORPORATED 2011-10-13 US disclosed
EP-2373411-A2 FLOW-THROUGH SUBSTRATES AND METHODS FOR MAKING AND USING THEM Corning Inc. (US) 2011-10-12 EP disclosed
EP-2367629-A2 COATED FLOW-THROUGH SUBSTRATES AND METHODS FOR MAKING AND USING THEM Corning Incorporated (US) 2011-09-28 EP disclosed
WO-2010080613-A2 COATED FLOW-THROUGH SUBSTRATES AND METHODS FOR MAKING AND USING THEM CORNING INCORPORATED (US) 2010-07-15 WO disclosed
WO-2010080602-A2 FLOW-THROUGH SUBSTRATES AND METHODS FOR MAKING AND USING THEM CORNING INCORPORATED (US) 2010-07-15 WO disclosed