SCHEMBL2418314

SCHEMBL2418314

CCC(=O)CC(N)=O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14890319 0.97 TDP1 (0.50)
SCHEMBL30693097 0.84 TDP1 (0.43)
SCHEMBL8693787 0.84 FFAR3 (0.43)
SCHEMBL20438307 0.82 TDP1 (0.41)
SCHEMBL5481394 0.79 LMNA (0.44)
SCHEMBL93369 0.79
SCHEMBL4673667 0.77
SCHEMBL31328777 0.76 TDP1 (0.64)
SCHEMBL29758624 0.76 TDP1 (0.64)
SCHEMBL9015855 0.76 TDP1 (0.64)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 153 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023147330-A1 PREPARATION OF UNSATURATED POLYESTERS EASTMAN CHEMICAL COMPANY (US) 2023-08-03 WO claimed
CN-109963909-A Polymer dispersions with reduced acetaldehyde release 斯塔尔国际有限公司 2019-07-02 CN claimed
CN-107850844-A Photosensitive resin composition, method for producing cured relief pattern, and semiconductor device 旭化成株式会社 2018-03-27 CN claimed
CN-107645968-A The mesoscopic structure particle for being loaded with preservative that aerosol obtains 佩洛特公司 2018-01-30 CN claimed
CN-107004575-A Anti-reflective coating cleaning and post etch residue removal composition with metal, dielectric and nitride compatibility 恩特格里斯公司 2017-08-01 CN claimed
US-20160002426-A1 Additives for Improving Polyurethane Foam Performance AIR PRODUCTS AND CHEMICALS, INC. (US) 2016-01-07 US claimed
US-5160679-A Urea-formaldehyde adhesive HEXION INC. 1992-11-03 US claimed
EP-4347673-A1 COMPOSITION INCLUDING CYCLIC IMIDE-CONTAINING MONOMER AND ORGANOBORANE COMPLEX AND RELATED ARTICLES AND METHODS 3M Innovative Properties Company (US) 2024-04-10 EP disclosed
WO-2023147330-A1 PREPARATION OF UNSATURATED POLYESTERS EASTMAN CHEMICAL COMPANY (US) 2023-08-03 WO disclosed
US-11578084-B2 Condensed ring compounds having dopamine D3 receptor antagonistic effect SHIONOGI & CO., LTD. (JP) 2023-02-14 US disclosed
WO-2022254369-A1 COMPOSITION INCLUDING CYCLIC IMIDE-CONTAINING MONOMER AND ORGANOBORANE COMPLEX AND RELATED ARTICLES AND METHODS 3M INNOVATIVE PROPERTIES COMPANY (US) 2022-12-08 WO disclosed
EP-2918422-B1 Reducing agent, ink-jet recording apparatus, discharge printing method, image forming method, reducing agent stabilizing method, and reducing agent enhancing method BROTHER IND LTD (JP) 2021-06-23 EP disclosed
WO-2018233526-A9 CSF1R INHIBITOR, AND MANUFACTURING METHOD THEREFOR AND APPLICATION THEREOF 上海和誉生物医药科技有限公司 2021-02-18 WO disclosed
EP-0438284-A1 Polymer emulsion SEQUA CHEMICALS INC. (US) 1991-07-24 EP disclosed
EP-0357244-A2 Method for converting nitriles to amides and amides to nitriles THE STANDARD OIL COMPANY (US) 1990-03-07 EP disclosed
EP-0005849-B2 PROCESS FOR PREPARING ALPHA-CHLORO-N-MONOALKYL-ACETOACETAMIDES Wacker-Chemie GmbH (DE) 1986-07-16 EP disclosed
EP-0083690-B1 POLYAMIDE ACID COMPOSITION FOR PREPARING POLYIMIDE AND PROCESS FOR PREPARING POLYIMIDE FROM THE SAME KANEGAFUCHI KAGAKU KOGYO KABUSHIKI KAISHA (JP) 1986-03-12 EP disclosed
EP-0114059-A2 Method of preparing a polyamide acid composition for preparing polyimide KANEGAFUCHI KAGAKU KOGYO KABUSHIKI KAISHA (JP) 1984-07-25 EP disclosed
EP-0083690-A1 Polyamide acid composition for preparing polyimide and process for preparing polyimide from the same KANEGAFUCHI KAGAKU KOGYO KABUSHIKI KAISHA (JP) 1983-07-20 EP disclosed
US-4265975-A STORAGE STABLE CHATTEM INC. (US) 1981-05-05 US disclosed