SCHEMBL24188

SCHEMBL24188

O=C(c1ccccc1)C(Cl)Cl

nearest known ligand 0.56

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 3/20 0.56
L3MBTL1 Q9Y468 2/20 0.56
PDPK1 O15530 1/20 0.56
CES1 P23141 5/20 0.54
CES2 O00748 4/20 0.54
LMNA P02545 2/20 0.54
ATM Q13315 3/20 0.53
GAA P10253 2/20 0.53
HSP90AA1 P07900 2/20 0.53
NPC1 O15118 1/20 0.53
RAB9A P51151 1/20 0.53
ALDH1A1 P00352 3/20 0.50
TSHR P16473 2/20 0.50
DAO P14920 1/20 0.50
NAPRT Q6XQN6 1/20 0.50
MDM2 Q00987 1/20 0.50
GPR55 Q9Y2T6 2/20 0.47
MEN1 O00255 2/20 0.47
KMT2A Q03164 2/20 0.47
MAPK1 P28482 2/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11287856 0.97 TDP1 (0.54) TDP1L3MBTL1PDPK1CES1CES2
Hydrochloric Acid SCHEMBL27977560 0.97 TDP1 (0.54) TDP1L3MBTL1PDPK1CES1CES2
Water SCHEMBL27597000 0.97 TDP1 (0.54) TDP1L3MBTL1PDPK1CES1CES2
SCHEMBL10789313 0.91 ALDH1A1 (0.61) TDP1L3MBTL1PDPK1CES1CES2
SCHEMBL10578495 0.86 PDPK1 (0.70) L3MBTL1PDPK1LMNAATMGAA
SCHEMBL31186169 0.86 PDPK1 (0.70) TDP1L3MBTL1PDPK1CES1CES2
SCHEMBL2238176 0.84 TDP1 (0.56) TDP1L3MBTL1CES1CES2LMNA
SCHEMBL2358014 0.84 ATM (0.64) TDP1L3MBTL1CES1CES2LMNA
SCHEMBL28102222 0.82 SRC (0.43) TDP1L3MBTL1PDPK1CES1CES2
SCHEMBL7384862 0.82 TDP1 (0.54) TDP1L3MBTL1CES1CES2LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 3751 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3042645-B2 Dental composites with improved storage stability IVOCLAR VIVADENT AG (LI) 2025-03-12 EP claimed
CN-118738319-A Preparation method and application of silicon-carbon anode material with high silane deposition rate 浙江格源新材料科技有限公司 2024-10-01 CN claimed
CN-118610398-A Silicon-carbon negative electrode prepared by photolytic silane and preparation method thereof 浙江格源新材料科技有限公司 2024-09-06 CN claimed
CN-113176707-B Photosensitive dry film and preparation method thereof 湖南朝泰建材有限公司 2024-08-16 CN claimed
CN-118206686-A Anti-swelling gel and preparation method and application thereof 鲁东大学 2024-06-18 CN claimed
CN-118126325-A Low-temperature-cured alkali-soluble photosensitive resin and preparation method thereof 深圳先进电子材料国际创新研究院 2024-06-04 CN claimed
CN-220345132-U Constant temperature crystallization box for dichloroacetophenone 山东东泰农化有限公司 2024-01-16 CN claimed
CN-110963907-B Green synthesis of 2, 2-dialkoxy acetophenone derivative 中国农业科学院植物保护研究所 2023-12-19 CN claimed
CN-116874659-A Low-temperature secondary photo-curing grafting oligomer and photosensitive resin composition containing same 深圳市安云鑫新材料科技有限公司 2023-10-13 CN claimed
CN-116239877-A Environment-friendly high polymer material and preparation method thereof 宜兴市晟阳自动化科技有限公司 2023-06-09 CN claimed
US-5387725-A Chlorinating compounds having acidic protons with a perchloro-alkane and aqueous base in the presence of a tetraalkyl-ammonium hydroxide phase transfer catalyst THE DOW CHEMICAL COMPANY (US) 1995-02-07 US claimed
EP-0611366-A1 CHLORINATION PROCESS, ALKYLATION OF PRODUCTS OF SAID PROCESS AND SOME PRODUCTS THEREOF THE DOW CHEMICAL COMPANY (US) 1994-08-24 EP claimed
US-5288915-A Process of making ketones THE DOW CHEMICAL COMPANY (US) 1994-02-22 US claimed
WO-1993009074-A2 CHLORINATION PROCESS, ALKYLATION OF PRODUCTS OF SAID PROCESS AND SOME PRODUCTS THEREOF THE DOW CHEMICAL COMPANY (US) 1993-05-13 WO claimed
WO-1993009082-A1 PROCESS OF MAKING KETONES THE DOW CHEMICAL COMPANY (US) 1993-05-13 WO claimed
EP-0287222-A2 Negative-working photoresists AUTOTYPE INTERNATIONAL LIMITED (GB) 1988-10-19 EP claimed
EP-0029105-B1 RADIATION CURABLE COATING COMPOSITION, PROCESS FOR COATING A SUBSTRATE THEREWITH, EYEGLASSES AND LAMINATE GAF CORPORATION (US) 1986-02-05 EP claimed
US-4319811-A OF TRIACRYLATES AND N-BINYL IMIDO GROUP GAF CORPORATION (US) 1982-03-16 US claimed
EP-0029105-A2 Radiation curable coating composition, process for coating a substrate therewith, eyeglasses and laminate GAF CORPORATION (US) 1981-05-27 EP claimed
US-4267388-A BY SULFONATING A BENZYL ALCOHOL COMPOUND, REDUCING THE SULFONYL DERIVATIVE TO A HALOSTYRENYL COMPOUND, AND DEHYDROHALOGENATING TO THE ETHYNYLBENZENE WILLIAM H. RORER, INC. (US) 1981-05-12 US claimed