SCHEMBL24189403

SCHEMBL24189403

CC1(I)CCS(=O)(=O)CC1

nearest known ligand 0.31

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.31
POLB P06746 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6876248 0.75 LMNA (0.33) LMNAPOLB
SCHEMBL7994599 0.71 ALDH1A1 (0.32) LMNAPOLB
SCHEMBL24595241 0.71 LMNA (0.31) LMNAPOLB
SCHEMBL24597217 0.71 LMNA (0.35) LMNAPOLB
SCHEMBL12344775 0.71 LMNA (0.35) LMNAPOLB
SCHEMBL16141984 0.69
Hydrochloric Acid SCHEMBL30896140 0.69 ALDH1A1 (0.31) LMNA
SCHEMBL13195668 0.67
SCHEMBL13523907 0.67
SCHEMBL1313724 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20220011666-A1 RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND RESIN TOKYO OHKA KOGYO CO., LTD. (JP) 2022-01-13 US disclosed