SCHEMBL24204875

SCHEMBL24204875

CC(C)COC(C)OC(=O)C1C[C@H]2C=CC1C2

nearest known ligand 0.48

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 9/20 0.48
KDM4E B2RXH2 2/20 0.41
LMNA P02545 2/20 0.41
POLB P06746 3/20 0.38
APEX1 P27695 1/20 0.38
RECQL P46063 1/20 0.38
BLM P54132 1/20 0.38
ESR2 Q92731 1/20 0.38
HSD17B10 Q99714 1/20 0.38
TDP1 Q9NUW8 1/20 0.38
L3MBTL1 Q9Y468 1/20 0.38
HPGD P15428 1/20 0.38
KMT2A Q03164 2/20 0.37
RAB9A P51151 1/20 0.37
CETP P11597 1/20 0.34
MAPK1 P28482 2/20 0.33
THRB P10828 1/20 0.32
MAPT P10636 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12506503 1.00 ALDH1A1 (0.48) ALDH1A1KDM4ELMNAPOLBAPEX1
SCHEMBL3368345 0.87 ALDH1A1 (0.49) ALDH1A1KDM4ELMNAPOLBAPEX1
SCHEMBL11800180 0.86 ALDH1A1 (0.56) ALDH1A1KDM4ELMNAPOLBAPEX1
SCHEMBL24355045 0.86 ALDH1A1 (0.46) ALDH1A1KDM4ELMNAPOLBAPEX1
SCHEMBL22263813 0.84 ALDH1A1 (0.47) ALDH1A1KDM4ELMNAPOLBAPEX1
SCHEMBL4379193 0.82 ALDH1A1 (0.46) ALDH1A1KDM4ELMNAPOLBAPEX1
SCHEMBL22263927 0.82 ALDH1A1 (0.52) ALDH1A1KDM4ELMNAPOLBAPEX1
SCHEMBL948252 0.82 ALDH1A1 (0.46) ALDH1A1KDM4ELMNAPOLBAPEX1
SCHEMBL22263633 0.81 ALDH1A1 (0.51) ALDH1A1KDM4ELMNAPOLBAPEX1
SCHEMBL952719 0.80 ALDH1A1 (0.56) ALDH1A1KDM4ELMNAPOLBAPEX1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20220128906-A1 PHOTORESIST PATTERN TRIMMING COMPOSITIONS AND METHODS OF TRIMMING PHOTORESIST PATTERNS DUPONT ELECTRONIC MATERIALS INTERNATIONAL, LLC 2022-04-28 US disclosed
US-20220019143-A1 PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2022-01-20 US disclosed