Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 10/20 | 0.46 |
| ▸ | HPGD | P15428 | 1/20 | 0.46 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.45 |
| ▸ | POLB | P06746 | 3/20 | 0.45 |
| ▸ | RAB9A | P51151 | 2/20 | 0.45 |
| ▸ | LMNA | P02545 | 2/20 | 0.45 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.45 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.43 |
| ▸ | APEX1 | P27695 | 1/20 | 0.43 |
| ▸ | RECQL | P46063 | 1/20 | 0.43 |
| ▸ | BLM | P54132 | 1/20 | 0.43 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.43 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.43 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.43 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.39 |
| ▸ | MAPT | P10636 | 1/20 | 0.36 |
| ▸ | TSHR | P16473 | 2/20 | 0.36 |
| ▸ | NPC1 | O15118 | 1/20 | 0.36 |
| ▸ | MEN1 | O00255 | 1/20 | 0.36 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL25567661 | 0.91 | ALDH1A1 (0.44) | ALDH1A1HPGDKMT2APOLBRAB9A | |
| SCHEMBL11908618 | 0.90 | ALDH1A1 (0.49) | ALDH1A1HPGDKMT2APOLBRAB9A | |
| SCHEMBL3690168 | 0.89 | ALDH1A1 (0.45) | ALDH1A1HPGDKMT2APOLBRAB9A | |
| SCHEMBL11908038 | 0.88 | ALDH1A1 (0.43) | ALDH1A1HPGDKMT2APOLBRAB9A | |
| SCHEMBL19498812 | 0.87 | LMNA (0.47) | ALDH1A1HPGDKMT2APOLBRAB9A | |
| SCHEMBL12228736 | 0.84 | ALDH1A1 (0.44) | ALDH1A1HPGDKMT2APOLBRAB9A | |
| SCHEMBL12228728 | 0.84 | ALDH1A1 (0.37) | ALDH1A1HPGDKMT2APOLBRAB9A | |
| SCHEMBL13744519 | 0.84 | ALDH1A1 (0.51) | ALDH1A1HPGDKMT2APOLBRAB9A | |
| SCHEMBL22263908 | 0.84 | ALDH1A1 (0.42) | ALDH1A1HPGDKMT2APOLBRAB9A | |
| SCHEMBL7895172 | 0.83 | ALDH1A1 (0.45) | ALDH1A1HPGDKMT2APOLBRAB9A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 122 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260078079-A1 | FRAGRANCE AND FLAVOR COMPOSITIONS COMPRISING NORBORNANE AND NORBORNENE DERIVATIVES | OSMO LABS PBC (US) | 2026-03-19 | — | — | US | disclosed |
| US-20240287268-A1 | RESIN FILM | MURATA MANUFACTURING CO., LTD. (JP) | 2024-08-29 | — | — | US | disclosed |
| US-11886119-B2 | Material for forming underlayer film, resist underlayer film, method of producing resist underlayer film, and laminate | MITSUI CHEMICALS, INC. (JP) | 2024-01-30 | — | — | US | disclosed |
| WO-2023203907-A1 | RESIN FILM | 株式会社村田製作所 | 2023-10-26 | — | — | WO | disclosed |
| US-20230185195-A1 | MATERIAL FOR FORMING UNDERLAYER FILM, RESIST UNDERLAYER FILM, METHOD OF PRODUCING RESIST UNDERLAYER FILM, AND LAMINATE | MITSUI CHEMICALS, INC. (JP) | 2023-06-15 | — | — | US | disclosed |
| US-11599025-B2 | Resin material for forming underlayer film, resist underlayer film, method of producing resist underlayer film, and laminate | MITSUI CHEMICALS, INC. (JP) | 2023-03-07 | — | — | US | disclosed |
| US-20200264511-A1 | MATERIAL FOR FORMING UNDERLAYER FILM, RESIST UNDERLAYER FILM, METHOD OF PRODUCING RESIST UNDERLAYER FILM, AND LAMINATE | MITSUI CHEMICALS, INC. (JP) | 2020-08-20 | — | — | US | disclosed |
| EP-3693793-A1 | RESIN MATERIAL FOR FORMING UNDERLAYER FILM, RESIST UNDERLAYER FILM, METHOD FOR PRODUCING RESIST UNDERLAYER FILM, AND LAYERED PRODUCT | Mitsui Chemicals, Inc. (JP) | 2020-08-12 | — | — | EP | disclosed |
| US-20200241419-A1 | RESIN MATERIAL FOR FORMING UNDERLAYER FILM, RESIST UNDERLAYER FILM, METHOD OF PRODUCING RESIST UNDERLAYER FILM, AND LAMINATE | MITSUI CHEMICALS, INC. (JP) | 2020-07-30 | — | — | US | disclosed |
| CN-111183395-A | Resin material for forming underlayer film, resist underlayer film, method for producing resist underlayer film, and laminate | 三井化学株式会社 | 2020-05-19 | — | — | CN | disclosed |
| US-6103445-A | POLYMER OF A T-BUTYL ESTER OF NORBORNENE CARBOXYLIC ACID ANALOG, A PHOTOACID GENERATOR, AND PLASTICIZER COMPRISING A DI-TERT-BUTYL ESTER OF A POLYCYCLIC DICARBOXYLIC ACID; TRANSPARENCY AT 193 NM AND AN ETCH RESISTANCE; RESOLUTION | BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM (US) | 2000-08-15 | — | — | US | disclosed |
| WO-2000020472-A1 | CATALYST AND METHODS FOR POLYMERIZING CYCLOOLEFINS | THE B.F. GOODRICH COMPANY (US) | 2000-04-13 | — | — | WO | disclosed |
| EP-0930541-A1 | Radiation sensitive resin composition | JSR Corporation (JP) | 1999-07-21 | — | — | EP | disclosed |
| EP-0789278-A2 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1997-08-13 | — | — | EP | disclosed |
| EP-0409291-B1 | Thermoplastic resin composition | JAPAN SYNTHETIC RUBBER CO LTD (JP) | 1996-02-14 | — | — | EP | disclosed |
| EP-0317262-B1 | Transparent resin material | JAPAN SYNTHETIC RUBBER CO LTD (JP) | 1996-01-31 | — | — | EP | disclosed |
| US-5164469-A | Substrate for optical disks, ring opening polymerization of tetracyclododecene derivatives | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1992-11-17 | — | — | US | disclosed |
| US-5053471-A | Methathesis ring opening polymerization of polar substituted norbornenes or octahydromethanonphthalenes; optics | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1991-10-01 | — | — | US | disclosed |
| EP-0409291-A2 | Thermoplastic resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1991-01-23 | — | — | EP | disclosed |
| EP-0317262-A2 | Transparent resin material | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1989-05-24 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260078079-A1 | FRAGRANCE AND FLAVOR COMPOSITIONS COMPRISING NORBORNANE AND NORBORNENE DERIVATIVES | CBR1, CBR3, TAS2R1 | ALDH1A1 804/4885HPGD 709/4885KMT2A 3953/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.