Known targets — ChEMBL curated mechanism
ADORA1ADORA2AADORA2BADORA3PDE3APDE3BPDE4APDE4BPDE4CPDE4D
The experimentally established mechanism targets of Propionic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | FFAR3 | O14843 | 2/20 | 0.67 |
| ▸ | GLRA1 | P23415 | 1/20 | 0.47 |
| ▸ | SLC6A9 | P48067 | 1/20 | 0.47 |
| ▸ | OR51E2 | Q9H255 | 1/20 | 0.47 |
| ▸ | BLM | P54132 | 2/20 | 0.46 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.46 |
| ▸ | GABRR1 | P24046 | 4/20 | 0.43 |
| ▸ | THRB | P10828 | 3/20 | 0.43 |
| ▸ | HDAC3 | O15379 | 2/20 | 0.43 |
| ▸ | HDAC1 | Q13547 | 2/20 | 0.43 |
| ▸ | HDAC2 | Q92769 | 2/20 | 0.43 |
| ▸ | HDAC8 | Q9BY41 | 2/20 | 0.43 |
| ▸ | LMNA | P02545 | 2/20 | 0.43 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.43 |
| ▸ | TSHR | P16473 | 2/20 | 0.43 |
| ▸ | HDAC11 | Q96DB2 | 2/20 | 0.43 |
| ▸ | GABRR3 | A8MPY1 | 1/20 | 0.43 |
| ▸ | GABRP | O00591 | 1/20 | 0.43 |
| ▸ | GABRD | O14764 | 1/20 | 0.43 |
| ▸ | GABBR2 | O75899 | 1/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Propionic Acid SCHEMBL2463993 | 1.00 | FFAR3 (0.67) | FFAR3GLRA1SLC6A9OR51E2BLM | |
| Propionic Acid SCHEMBL219329 | 0.97 | FFAR3 (0.71) | FFAR3GLRA1SLC6A9OR51E2BLM | |
| Propionic Acid SCHEMBL5711851 | 0.97 | — | — | |
| Propionic Acid SCHEMBL10877398 | 0.97 | FFAR3 (0.71) | FFAR3GLRA1SLC6A9OR51E2BLM | |
| Propionic Acid SCHEMBL452287 | 0.97 | FFAR3 (0.71) | FFAR3GLRA1SLC6A9OR51E2BLM | |
| Propionic Acid SCHEMBL10878598 | 0.97 | FFAR3 (0.71) | FFAR3GLRA1SLC6A9OR51E2BLM | |
| Propionic Acid SCHEMBL29198011 | 0.93 | FFAR3 (0.67) | FFAR3GLRA1SLC6A9OR51E2BLM | |
| Propionic Acid SCHEMBL28965995 | 0.93 | FFAR3 (0.67) | FFAR3GLRA1SLC6A9OR51E2BLM | |
| Propionic Acid SCHEMBL8646907 | 0.90 | FFAR3 (0.62) | FFAR3GLRA1SLC6A9OR51E2BLM | |
| Propionic Acid SCHEMBL29012488 | 0.90 | FFAR3 (0.62) | FFAR3GLRA1SLC6A9OR51E2BLM |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2006039090-A2 | SOLUTIONS FOR CLEANING SILICON SEMICONDUCTORS OR SILICON OXIDES | LAM RESEARCH CORPORATION (US) | 2006-04-13 | — | — | WO | claimed |
| US-20060073997-A1 | Solutions for cleaning silicon semiconductors or silicon oxides | LAM RESEARCH CORPORATION (US) | 2006-04-06 | — | — | US | claimed |
| US-8900371-B2 | Cleaning agent for substrate and cleaning method | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2014-12-02 | — | — | US | disclosed |
| US-20120000485-A1 | CLEANING AGENT FOR SUBSTRATE AND CLEANING METHOD | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2012-01-05 | — | — | US | disclosed |
| US-7375066-B2 | For cleaning after chemical mechanical polishing to remove copper oxide particles without corroding copper wiring or harming silicon dioxide layer; specified number of cleaning agents such as 2,2'-dipyridyl | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2008-05-20 | — | — | US | disclosed |
| US-20080020243-A1 | CARBONIC ACID ESTER, PRODUCTION PROCESS THEREFOR, AND MAGNETIC RECORDING MEDIUM | FUJIFILM CORPORATION (JP) | 2008-01-24 | — | — | US | disclosed |
| US-20070235061-A1 | Cleaning Agent for Substrate and Cleaning Method | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2007-10-11 | — | — | US | disclosed |
| EP-1679361-A1 | CLEANING AGENT FOR SUBSTRATE AND CLEANING METHOD | Wako Pure Chemical Industries, Ltd. (JP) | 2006-07-12 | — | — | EP | disclosed |
| WO-2006039090-A2 | SOLUTIONS FOR CLEANING SILICON SEMICONDUCTORS OR SILICON OXIDES | LAM RESEARCH CORPORATION (US) | 2006-04-13 | — | — | WO | disclosed |
| US-20060073997-A1 | Solutions for cleaning silicon semiconductors or silicon oxides | LAM RESEARCH CORPORATION (US) | 2006-04-06 | — | — | US | disclosed |
| CN-1664164-A | Hafnium-containing material for film formation, method for producing the same, and method for producing hafnium-containing thin film using the same | MITSUBISHI MATERIALS CORP (JP) | 2005-09-07 | — | — | CN | disclosed |
| US-20030083214-A1 | Semiconductor wafer cleaning agent and cleaning method | FUJIFILM ELECTRONIC MATERIALS CO., LTD. (JP) | 2003-05-01 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20080020243-A1 | CARBONIC ACID ESTER, PRODUCTION PROCESS THEREFOR, AND MAGNETIC RECORDING MEDIUM | FAR1, CYP4F11, CA11 | FFAR3 51/4885GLRA1 220/4885SLC6A9 1090/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.