SCHEMBL2422115

SCHEMBL2422115

c1ccc(-c2ccccc2-c2c(-c3ccccc3)cccc2-c2ccccc2)cc1

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 5/20 0.48
HSD17B10 Q99714 2/20 0.48
HPGD P15428 1/20 0.48
BCL2L1 Q07817 1/20 0.48
CYP2A6 P11509 1/20 0.48
MAPK1 P28482 1/20 0.48
HNF4A P41235 1/20 0.46
HDAC4 P56524 1/20 0.46
HDAC2 Q92769 1/20 0.46
HDAC8 Q9BY41 1/20 0.46
HDAC6 Q9UBN7 1/20 0.46
BACE1 P56817 1/20 0.43
PTGS2 P35354 1/20 0.43
DPP4 P27487 1/20 0.42
PDCD1 Q15116 1/20 0.41
CD274 Q9NZQ7 1/20 0.41
GPR55 Q9Y2T6 1/20 0.40
TDP1 Q9NUW8 1/20 0.39
BCAT2 O15382 1/20 0.39
LMNA P02545 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Phosphine SCHEMBL10933589 0.97 ALDH1A1 (0.46) ALDH1A1HSD17B10HPGDBCL2L1CYP2A6
SCHEMBL11762758 0.97 ALDH1A1 (0.46) ALDH1A1HSD17B10HPGDBCL2L1CYP2A6
SCHEMBL2373718 0.92 ALDH1A1 (0.46) ALDH1A1HSD17B10HPGDBCL2L1CYP2A6
SCHEMBL30395776 0.92 ALDH1A1 (0.46) ALDH1A1HSD17B10HPGDBCL2L1CYP2A6
SCHEMBL2167186 0.92 ALDH1A1 (0.46) ALDH1A1HSD17B10HPGDBCL2L1CYP2A6
SCHEMBL30355086 0.92 ALDH1A1 (0.46) ALDH1A1HSD17B10HPGDBCL2L1CYP2A6
Hydrogen Sulfide SCHEMBL27549591 0.89 ALDH1A1 (0.44) ALDH1A1HSD17B10HPGDBCL2L1CYP2A6
Phosphine SCHEMBL27403569 0.89 ALDH1A1 (0.44) ALDH1A1HSD17B10HPGDBCL2L1CYP2A6
SCHEMBL27816522 0.87 ALDH1A1 (0.58) ALDH1A1HSD17B10HPGDBCL2L1CYP2A6
SCHEMBL31265362 0.87 ALDH1A1 (0.58) ALDH1A1HSD17B10HPGDBCL2L1CYP2A6

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240407244-A1 MIXED POWDER FOR AN ORGANIC ELECTROLUMINESCENCE DEVICE AND METHOD FOR PRODUCING THE SAME, METHOD FOR FABRICATING ORGANIC ELECTROLUMINESCENCE DEVICE BY USING THE MIXED POWDER, METHOD FOR SELECTING COMPOUNDS IN THE MIXED POWDER, AND COMPOSITION FOR VACUUM DEPOSITION IDEMITSU KOSAN CO.,LTD. (JP) 2024-12-05 US disclosed
WO-2023063163-A1 MIXED POWDER FOR ORGANIC ELECTROLUMINESCENT ELEMENT, PRODUCTION METHOD THEREFOR, METHOD FOR MANUFACTURING ORGANIC ELECTROLUMINESCENT ELEMENT USING SAID MIXED POWDER, METHOD FOR SELECTING COMPOUND IN SAID MIXED POWDER, AND COMPOSITION FOR VACUUM DEPOSITION 出光興産株式会社 2023-04-20 WO disclosed
WO-2022244864-A1 MIXED POWDER, VAPOR DEPOSITION METHOD FOR ORGANIC COMPOUND, METHOD FOR PRODUCING ORGANIC ELECTROLUMINESCENT ELEMENT, METHOD FOR SELECTING ORGANIC COMPOUND, AND VAPOR DEPOSITION METHOD 出光興産株式会社 2022-11-24 WO disclosed
EP-1827859-B1 COMPOSITION FOR FORMING A LASER-MARKABLE COATING AND PROCESS FOR FORMING A MARKING BY LASER EXPOSURE FUJI HUNT PHOTO CHEM (US) 2011-09-07 EP disclosed
EP-2064069-A1 COATING COMPOSITION FOR FORMING A LASER-MARKABLE MATERIAL AND A LASER-MARKABLE MATERIAL FUJI HUNT PHOTOGRAPHIC CHEMICALS, INC. (US) 2009-06-03 EP disclosed
WO-2009009066-A1 COATING COMPOSITION FOR FORMING LASER-MARKABLE MATERIAL HAVING HEAT AND HUMIDITY STABILITY FUJIFILM HUNT CHEMICALS U.S.A., INC. (US) 2009-01-15 WO disclosed
WO-2007114829-A1 COATING COMPOSITION FOR FORMING A LASER-MARKABLE MATERIAL AND A LASER-MARKABLE MATERIAL FUJI HUNT PHOTOGRAPHIC CHEMICALS, INC. (US) 2007-10-11 WO disclosed
EP-1827859-A2 COMPOSITION FOR FORMING A LASER-MARKABLE COATING AND PROCESS FOR FORMING A MARKING BY LASER EXPOSURE FUJI HUNT PHOTOGRAPHIC CHEMICALS, INC. (US) 2007-09-05 EP disclosed
US-20070098900-A1 Media providing non-contacting formation of high contrast marks and method of using same, composition for forming a laser-markable coating, a laser-markable material and process of forming a marking FUJI HUNT PHOTOGRAPHIC CHEMICALS, INC. 2007-05-03 US disclosed
WO-2006052843-A9 MEDIA PROVIDING NON-CONTACTING FORMATION OF HIGH CONTRAST MARKS AND METHOD OF USE FUJI HUNT PHOTO CHEM (US) 2006-08-31 WO disclosed
WO-2006063165-A9 COMPOSITION FOR FORMING A LASER-MARKABLE COATING AND PROCESS FOR FORMING A MARKING BY LASER EXPOSURE FUJI HUNT PHOTO CHEM (US) 2006-07-13 WO disclosed
WO-2006063165-A2 COMPOSITION FOR FORMING A LASER-MARKABLE COATING AND PROCESS FOR FORMING A MARKING BY LASER EXPOSURE FUJI HUNT PHOTOGRAPHIC CHEMICALS, INC. (US) 2006-06-15 WO disclosed
WO-2006052843-A2 MEDIA PROVIDING NON-CONTACTING FORMATION OF HIGH CONTRAST MARKS AND METHOD OF USE FUJI HUNT PHOTOGRAPHIC CHEMICALS, INC. (US) 2006-05-18 WO disclosed
US-6797318-B2 PROTECTIVE COATING CONTAINING AMIDE COMPOUND AND WATER SOLUBLE POLYMER IMPROVES HEAD-MATCHING PROPERTY; MATERIALS HANDLING FUJI PHOTO FILM CO., LTD. (JP) 2004-09-28 US disclosed
US-20020061820-A1 Heat-sensitive recording material and heat-sensitive recording process FUJI PHOTO FILM CO., LTD. 2002-05-23 US disclosed