Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 1/20 | 0.41 |
| ▸ | NR1H3 | Q13133 | 9/20 | 0.41 |
| ▸ | NR1H2 | P55055 | 8/20 | 0.41 |
| ▸ | MLYCD | O95822 | 7/20 | 0.40 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.38 |
| ▸ | RORC | P51449 | 1/20 | 0.38 |
| ▸ | GAA | P10253 | 1/20 | 0.36 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13163546 | 0.83 | NR1H3 (0.45) | LMNANR1H3NR1H2MLYCDSMN1; SMN2 | |
| SCHEMBL14556842 | 0.82 | NR1H3 (0.44) | LMNANR1H3NR1H2MLYCDSMN1; SMN2 | |
| SCHEMBL24218974 | 0.80 | SMN1; SMN2 (0.46) | LMNANR1H3NR1H2MLYCDSMN1; SMN2 | |
| SCHEMBL15840364 | 0.69 | SMN1; SMN2 (0.47) | LMNANR1H3NR1H2MLYCDSMN1; SMN2 | |
| SCHEMBL2733978 | 0.69 | CYP2C19 (0.42) | LMNANR1H3NR1H2 | |
| SCHEMBL13222562 | 0.68 | CYP2C19 (0.41) | LMNANR1H3NR1H2MAPK1 | |
| SCHEMBL13059563 | 0.68 | ELANE (0.47) | LMNANR1H3NR1H2MLYCDSMN1; SMN2 | |
| SCHEMBL13059567 | 0.66 | NR1H2 (0.60) | LMNANR1H3NR1H2MLYCDSMN1; SMN2 | |
| SCHEMBL24383566 | 0.65 | NR1H2 (0.49) | LMNANR1H3NR1H2MLYCDSMN1; SMN2 | |
| SCHEMBL12009253 | 0.65 | NPC1 (0.38) | SMN1; SMN2RORCMAPK1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11835860-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-12-05 | — | — | US | disclosed |
| US-20220026804-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2022-01-27 | — | — | US | disclosed |