Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.47 |
| ▸ | MLYCD | O95822 | 5/20 | 0.43 |
| ▸ | NR1H3 | Q13133 | 9/20 | 0.42 |
| ▸ | NR1H2 | P55055 | 8/20 | 0.42 |
| ▸ | LMNA | P02545 | 2/20 | 0.40 |
| ▸ | HTT | P42858 | 1/20 | 0.40 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10396191 | 0.92 | NPSR1 (0.37) | SMN1; SMN2MLYCDNR1H3NR1H2LMNA | |
| SCHEMBL24908565 | 0.86 | ESR1 (0.40) | SMN1; SMN2LMNANPSR1 | |
| SCHEMBL7084775 | 0.86 | RORC (0.38) | SMN1; SMN2LMNAHTTNPSR1 | |
| SCHEMBL22336361 | 0.85 | NR1H3 (0.38) | SMN1; SMN2MLYCDNR1H3NR1H2 | |
| SCHEMBL3692621 | 0.84 | ELANE (0.41) | NR1H3NR1H2LMNANPSR1 | |
| SCHEMBL2465362 | 0.79 | PGK1 (0.40) | SMN1; SMN2NPSR1 | |
| SCHEMBL15840341 | 0.79 | ELANE (0.50) | SMN1; SMN2MLYCDNR1H3NR1H2LMNA | |
| SCHEMBL10396190 | 0.78 | LMNA (0.38) | SMN1; SMN2MLYCDLMNANPSR1 | |
| SCHEMBL26794304 | 0.78 | ESR1 (0.41) | — | |
| SCHEMBL22317809 | 0.78 | LMNA (0.35) | SMN1; SMN2MLYCDNR1H3NR1H2LMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11815814-B2 | Iodized aromatic carboxylic acid type pendant-containing polymer, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-11-14 | — | — | US | disclosed |
| US-11703760-B2 | Fluorocarboxylic acid-containing monomer, fluorocarboxylic acid-containing polymer, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-07-18 | — | — | US | disclosed |
| US-20230159766-A1 | CONDUCTIVE POLYMER COMPOSITION, SUBSTRATE, AND METHOD FOR PRODUCING SUBSTRATE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-25 | — | — | US | disclosed |
| EP-3693979-B1 | CONDUCTIVE POLYMER COMPOSITE AND CONDUCTIVE POLYMER COMPOSITION | SHINETSU CHEMICAL CO (JP) | 2022-05-04 | — | — | EP | disclosed |
| US-20210380738-A1 | CONDUCTIVE POLYMER COMPOSITION, SUBSTRATE, AND METHOD FOR PRODUCING SUBSTRATE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2021-12-09 | — | — | US | disclosed |
| US-20210341839-A1 | FLUOROCARBOXYLIC ACID-CONTAINING MONOMER, FLUOROCARBOXYLIC ACID-CONTAINING POLYMER, RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2021-11-04 | — | — | US | disclosed |
| US-20210333712-A1 | IODIZED AROMATIC CARBOXYLIC ACID TYPE PENDANT-CONTAINING POLYMER, RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2021-10-28 | — | — | US | disclosed |
| US-20200259094-A1 | CONDUCTIVE POLYMER COMPOSITE AND CONDUCTIVE POLYMER COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-08-13 | — | — | US | disclosed |
| US-10023752-B2 | Conductive material and substrate | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-07-17 | — | — | US | disclosed |
| US-20170174922-A1 | CONDUCTIVE MATERIAL AND SUBSTRATE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-06-22 | — | — | US | disclosed |
| US-20170130071-A1 | CONDUCTIVE MATERIAL AND SUBSTRATE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-05-11 | — | — | US | disclosed |
| US-20170130070-A1 | CONDUCTIVE MATERIAL AND SUBSTRATE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-05-11 | — | — | US | disclosed |
| US-9201300-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-12-01 | — | — | US | disclosed |
| US-20140178818-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-06-26 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20210341839-A1 | FLUOROCARBOXYLIC ACID-CONTAINING MONOMER, FLUOROCARBOXYLIC ACID-CONTAINING POLYMER, RESIST COMPOSITION AND PATTERNING PROCESS | NAF1, PFN1, COL1A1 | SMN1; SMN2 1972/4885MLYCD 2729/4885NR1H3 4662/4885 |
| US-11703760-B2 | Fluorocarboxylic acid-containing monomer, fluorocarboxylic acid-containing polymer, resist composition and patterning process | NAF1, PFN1, COL1A1 | SMN1; SMN2 1972/4885MLYCD 2729/4885NR1H3 4662/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.